Výpis publikací

VAŠINA, Petr, Tereza SCHMIDTOVÁ a Marek ELIÁŠ. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions. Plasma Sources Science and Technology. Bristol: Institute of Physics Publishing, 2009, roč. 18, č. 2, 8 s. ISSN 0963-0252.

VAŠINA, Petr, Tereza HYTKOVÁ a Marek ELIÁŠ. Model of reactive magnetron sputtering process with non-uniform discharge current density. In Proceeding of XXVIII International Conference on Phenomena in Ionized Gases. Praha: Institute of Plasma Physics AVCR, 2007, s. 1-4. ISBN 978-80-87026-01-4.