Masaryk University

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    2009

    1. VAŠINA, Petr, Tereza SCHMIDTOVÁ and Marek ELIÁŠ. Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions. Plasma Sources Science and Technology. Bristol: Institute of Physics Publishing, 2009, vol. 18, No 2, 8 pp. ISSN 0963-0252.

    2007

    1. DE POUCQUES, Ludovic, Jean-Christophe IMBERT, Carolline BOISSE-LAPORTE, Jean BRETAGNE, Mihai GANCIU, Lionel TEULÉ-GAY, Petr VAŠINA and Michel TOUZEAU. Analysis of the Transport of Ionized Titanium Atoms in a Highly Ionized Sputter Deposition Process. Plasma processes and polymers. Weinheim: Wiley-VCH, 2007, 4/2007, S1, p. S424-S429, 5 pp. ISSN 1612-8850.
    2. MIKULA, Marián, Branislav GRANČIČ, Vilma BURŠÍKOVÁ, Adrián CSUBA, Milan DRŽÍK, Štefan KAVECKÝ, Andrej PLECENIK and Peter KÚŠ. Mechanical properties of superhard TiB2 coatings prepared by DC magnetron sputtering. Vacuum. USA: ELSEVIER (PERGAMON), 2007, vol. 82, No 2, p. 278-281. ISSN 0042-207X.
    3. VAŠINA, Petr, Tereza HYTKOVÁ and Marek ELIÁŠ. Model of reactive magnetron sputtering process with non-uniform discharge current density. In Proceeding of XXVIII International Conference on Phenomena in Ionized Gases. Praha: Institute of Plasma Physics AVCR, 2007, p. 1-4. ISBN 978-80-87026-01-4.

    2005

    1. VAŠINA, Petr, Martina MRÁZKOVÁ, Marcel MEŠKO, Jean-Christophe IMBERT, Mihai GANCIU, Caroline BOISSE-LAPORTE, Ludovic DE POUCQUES, Michel TOUZEAU, Daniel PAGNON and Jean BRETAGNE. Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate. In Proceeding of 27th International Conference on Phenomena in Ionised Gases. Eidhoven: Eidhoven University of Technology, 2005, p. 1-4.
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