Masaryk University

Publication Records

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    2006

    1. FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK, Růžena NEPUSTILOVÁ and Svatopluk BAJER. Characterization of polymer thin films deposited on aluminum films by the combined optical method and atomic force microscopy. Surface and Interface Analysis. USA: John Wiley & Sons, 2006, vol. 38, No 4, p. 842-846. ISSN 0142-2421.
    2. VALTR, Miroslav, Ivan OHLÍDAL and Daniel FRANTA. Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry. Czech. J. Phys. Praha: Institute of Physics Academy of Sciences, 2006, 56/2006, Suppl. B, p. 1103 - 1109. ISSN 0011-4626.

    2005

    1. JAN, Mistrík, Ivan OHLÍDAL, Roman ANTOŠ, Mitsuru AOYAMA and Tomuo YAMAGUCHI. Evidence of refractive index change in glass substrates induced by high-density reactive ion plating deposition of SiO2 films. Applied Surface Science. USA: ELSEVIER (NORTH-HOLLAND), 2005, vol. 244, 1-4, p. 51-54. ISSN 0169-4332.
    2. FRANTA, Daniel, Ivan OHLÍDAL, Jan MISTÍK, Tomuo YAMAGUCHI, Gu Jin HU and Ning DAI. Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions. Applied Surface Science. USA: ELSEVIER (NORTH-HOLLAND), 2005, vol. 244, 1-4, p. 338-342. ISSN 0169-4332.
    3. FRANTA, Daniel, Beatrice NEGULESCU, Luc THOMAS, Pierre Richard DAHOO, Marcel GUYOT, Ivan OHLÍDAL, Jan MISTRÍK and Tomuo YAMAGUCHI. Optical properties of NiO thin films prepared by pulsed laser deposition technique. Applied Surface Science. USA: ELSEVIER (NORTH-HOLLAND), 2005, vol. 244, 1-4, p. 426-430. ISSN 0169-4332.
    4. MISTRÍK, Jan, Tomuo YAMAGUCHI, Daniel FRANTA, Ivan OHLÍDAL, Gu Jin HU and Ning DAI. Optical properties of slightly rough LaNiO3 thin films studied by spectroscopic ellipsometry and reflectometry. Applied Surface Science. USA: ELSEVIER (NORTH-HOLLAND), 2005, vol. 244, 1-4, p. 431-434. ISSN 0169-4332.

    2001

    1. FRANTA, Daniel, Ivan OHLÍDAL, Miloslav FRUMAR and Jaroslav JEDELSKÝ. Optical Characterization of Chalcogenide Thin Films. Applied Surface Science. USA: ELSEVIER (NORTH-HOLLAND), 2001, 175-176, No 1, p. 555-561. ISSN 0169-4332.
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