Masaryk University

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    2009

  1. VAŠINA, Petr and Pavel DVOŘÁK. Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process. Europhysics Letters, European Physical Society, 2009, vol. 85, No 1, p. 15002-15006. ISSN 0295-5075.
  2. DVOŘÁK, Pavel and Zdeněk MORAVEC. Higher harmonics of plasma potential in capacitively coupled discharges. In Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts. Brno: VUT Brno, 2009. p. 57. ISBN 978-80-214-3875-0.
  3. VAŠINA, Petr and Pavel DVOŘÁK. Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? In Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts. Brno: VUT Brno, 2009. p. 74. ISBN 978-80-214-3875-0.
  4. 2008

  5. DVOŘÁK, Pavel and Zdeněk MORAVEC. DEPENDENCE OF HIGHER HARMONIC FREQUENCIES MEASURED IN CAPACITIVELY COUPLED PLASMA ON THE MATCHING UNIT PARAMETERS. Chemické listy, Brno: Česká společnost chemická, 2008, vol. 102, s1311-1538, p. 1356 - 1359. ISSN 1803-2389.
  6. DVOŘÁK, Pavel and Petr VAŠINA. Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process. In 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts. 32 A. Granada: European Physical Society, 2008. p. 78P (topic 5), 2 pp. ISBN 2-914771-04-5.
  7. DVOŘÁK, Pavel and Zdeněk MORAVEC. Higher harmonic frequencies measured in Capacitively Coupled Plasma. In 2nd CESPC - Book of extended abstracts. Brno: Ústav fyzikální elektroniky (PřF MU), JČM, 2008. p. 74.
  8. DVOŘÁK, Pavel and Petr VAŠINA. Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process. In Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology. Praha: CVUT v Praze, 2008. p. 91-92, 1 pp. ISBN 978-80-01-04030-0.
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