Výpis publikací

RUDOLF, Pavel, František POCHYLÝ, Pavel SŤAHEL, Jozef RÁHEĽ, Jan ČECH a Blahoslav MARŠÁLEK. DEVICE FOR TREATMENT OF LIQUIDS AND THE METHOD OF TREATMENT OF LIQUIDS WITH USE OF THIS DEVICE. 2023. Patent. Číslo: IL293579. Vydavatel: State of Israel Patent Office. Místo vydání: Israel. Název vlastníka: Vysoké učení technické v Brně; Masarykova univerzita, Brno; Botanický ústav AV ČR. Datum registrace: 2. 6. 2022. Datum přijetí: 2. 8. 2023.

VAŠINA, Petr a Pavel DVOŘÁK. Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process. Europhysics Letters. European Physical Society, 2009, roč. 85, č. 1, s. 15002-15006. ISSN 0295-5075.

DVOŘÁK, Pavel a Zdeněk MORAVEC. Higher harmonics of plasma potential in capacitively coupled discharges. In Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts. Brno: VUT Brno, 2009, s. 57. ISBN 978-80-214-3875-0.

VAŠINA, Petr a Pavel DVOŘÁK. Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? In Frontiers in Low Temperature Plasma Diagnostics 8 - Book of abstracts. Brno: VUT Brno, 2009, s. 74. ISBN 978-80-214-3875-0.

DVOŘÁK, Pavel a Zdeněk MORAVEC. DEPENDENCE OF HIGHER HARMONIC FREQUENCIES MEASURED IN CAPACITIVELY COUPLED PLASMA ON THE MATCHING UNIT PARAMETERS. Chemické listy. Brno: Česká společnost chemická, 2008, roč. 102, s1311-1538, s. 1356 - 1359. ISSN 1803-2389.

DVOŘÁK, Pavel a Petr VAŠINA. Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process. In 19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts. 32 A. Granada: European Physical Society, 2008, s. 78P (topic 5), 2 s. ISBN 2-914771-04-5.

DVOŘÁK, Pavel a Petr VAŠINA. Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process. In Programme and Abstract Book of the 23rd Symposium on Plasma Physics and Technology. Praha: CVUT v Praze, 2008, s. 91-92, 1 s. ISBN 978-80-01-04030-0.

JANOUŠKOVCOVÁ, Eva, Miloš KLÍMA, Lenka ZAJÍČKOVÁ a Jozef RÁHEĽ. Nanotechnologie pro průmysl a zábavu. 2008.

NAVRÁTIL, Zdeněk, David TRUNEC a Pavel DVOŘÁK. Radial Structure of RF Discharge in Neon. In 2nd Central European Symposium on Plasma Chemistry - Book of Extended Abstracts. Brno: Ústav fyzikální elektroniky (PřF MU), JČM, 2008, s. 77 - 78.

DOLEŽAL, Vojtěch, Pavel DVOŘÁK a Jan JANČA. Influence of methane on the capacitively coupled hydrogen discharge. Czechoslovak journal of physics. Praha, Czech republic: Institute of Physics, Acad. Sci. CR, 2006, roč. 56, Suppl.B, s. B697-B701, 5 s. ISSN 0011-4626.

VALTR, Miroslav, Ivan OHLÍDAL a Petr KLAPETEK. AFM Study of Hydrocarbon Thin Films. In WDS'05 Proceedings of Contributed Papers: Part II - Physics of Plasmas and Ionized Media (ed. J. Safrankova). Praha: Matfyzpress, 2005, s. 391-396. ISBN 80-86732-59-2.

NAVRÁTIL, Vladislav. Kirlian Photography a Possible Diagnostic Metod. In ŘEHULKA, Evžen. SCHOOL AND HEALTH 21(1), VOLS 2. 1. vyd. Brno: Masarykova univerzita, 2005, s. 1163-1170. ISBN 978-80-7315-119-5.

VALTR, Miroslav, Lenka ZAJÍČKOVÁ a Vilma BURŠÍKOVÁ. Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO. In JUNIORMAT 03. 1. vyd. Brno: ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie, 2003, s. 58-59. ISBN 80-214-2462-1.

BRABLEC, Antonín, Pavel SLAVÍČEK, Vratislav KAPIČKA, Miloš KLÍMA, Marek ELIÁŠ, Miloš ŠÍCHA, D. SLAVINSKÁ, M. TRCHOVÁ a H. BIEDERMAN. Deposition of polymer films in rf discharge at atmospheric pressure. In 15th ISPC symposium proceedings, vol VI. Orleans,France: GREMI, CNRS/University of Orleans, 2001, s. 2329-2333.

KLÍMA, Miloš, Martin ŠÍRA, Vratislav KAPIČKA, Jan JANČA a Pavel SLAVÍČEK. Diagnostics of hf-plasma pencil in liquids. In XIV Symposium on Physics of Switching Arc. Brno, Czech Republic: FEECS TU BRNO, 2001, s. 93-96. ISBN 80-214-1949-0.

JAŠEK, Ondřej, Jan JANČA, Miloš KLÍMA a Vít KUDRLE. Study of hydrocarbons decomposition in microwave discharge and mass spectrometry of radiofrequency discharges in liquids. In SAPP 13th Symposium Proceedings. Bratislava: MFF UK, 2001, s. 96-97. ISBN 80-223-1573-7.

VALTR, Miroslav, Lenka ZAJÍČKOVÁ a Siegmar RUDAKOWSKI. Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor. In JUNIORMAT 01. 1. vyd. Brno: ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie, 2001, s. 277-278. ISBN 80-214-1885-0.

JANČA, Jan, Miloš KLÍMA, Pavel SLAVÍČEK a Lenka ZAJÍČKOVÁ. Diagnostics and Applications of High Frequency Plasma Pencil. In Proceedings of 14th International Symposium on Plasma Chemistry. Prague (Czech Rep.): Institute of Plasma Physics AV CR, 1999, s. 887-890. ISBN 80-902724-3-6.

JAŠEK, Ondřej, Jan JANČA a Miloš KLÍMA. Synthesis of fullerenes by radiofrequency plasma discharges. In In Proceedings of 14th International Symposium on Plasma Chemistry. 1999. vyd. Praha: Institute of Plasma Physics AS CR, 1999, s. 2223-4450. ISBN 80-902724-3-6.

KLÍMA, Miloš, Jan JANČA, Lenka ZAJÍČKOVÁ, Pavel SLAVÍČEK a Pavel SULOVSKÝ. Application of plasma-liquid system to conservation treatment of ancient artifacts. In ELMECO 97. Naleczow, Poland: Lublin Tech. University, Poland, 1997, s. 20-25. ISBN 83-87270-86-5.

KLÍMA, Miloš, Jan JANČA, Pavel SLAVÍČEK, Lenka ZAJÍČKOVÁ a Antonín BRABLEC. New methods applying plasma in liquid environment for the treatment and conservation of ancient artefacts. In 18th Symp. on Plasma Physics and Technology. Prague, Czech Republic: Czech Tech. University, Prague, 1997, s. 285-287. ISBN 80-01-01641-2.

KLÍMA, Miloš, Lenka ZAJÍČKOVÁ a Jan JANČA. The perspectives of plasmachemical treatment of ancient artifacts. Z. für Schweizerische Archäelogie und Kunstgeschichte. 1997, roč. 1997, č. 54, s. 31.