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Curriculum vitae

Person Identification
  • Miroslav Valtr
    Born November 9, 1979 in Brno, Czech Republic
    married, 3 children
Workplace
  • Czech Metrology Institute
    Department of Nanometrology
    Okružní 31
    638 00 Brno
    Czech Republic
Employment Position
  • metrologist
Education and Academic Qualifications
  • 30. 9. 2010: Ph.D. in Plasma Physics
  • 2003 - 2010: Masaryk University in Brno, Faculty of Science, Ph.D. student, Ph.D. thesis: Deposition of Carbon Films in Plasma and Their Characterisation
  • 13. 6. 2003: M.Sc. (equiv.) in Physics, Diploma thesis: Plasma Deposition of Thin DLC:SiOx Films and Their Characterisation
  • 1998 - 2003: Masaryk University in Brno, Faculty of Science
  • 1991 - 1998: Secondary School 'Gymnazium', Mikulov
  • 1986 - 1991: Primary School, Mikulov
Employment Summary
  • since 2. 1. 2007: Czech Metrology Institute, Department of Nanometrology, metrologist
  • 1. 1. 2006 - 31. 12. 2006: Department of Physical Electronics, faculty of Science, Masaryk University, research scientist
  • summer of 2002: worker for TESLA SEZAM Roznov p.R., a prominent manufacturer of semiconductor components
Scientific and Research Activities
  • 2007 - now: research and development in the field of scanning probe microscopy, ResearcherID: E-3342-2012, ORCID: 0000-0002-7628-9184
  • 2004 - 2006: PECVD deposition of carbon thin films, ellipsometrical measurement, measurement of reflectance, under Prof. Ivan Ohlidal, Department of Physical Electronics, Masaryk University
  • 2002 - 2003: deposition and characterisation of DLC films deposited by PECVD, under Dr. L. Zajickova, Department of Physical Electronics, Masaryk University, co-solver of the FRVS 0601/2003 grant from Ministry of Education
  • 2001: study of surface energy of polymer-like thin films deposited by PECVD by means of contact angle measurements, in the group of Prof. C. Wiesemann at the Ruhr-Universitaet Bochum
  • 2000 - 2001: research work within the range of the FRVS 0610/2001 grant from Ministry of Education, under the leadership Dr. L. Zajickova, Plasmochemical Laboratory, Masaryk University
Academical Stays
  • 10/2001 - 12/2001: Department of Physics, Ruhr-Universitaet Bochum, Germany (in the research group of Prof. C. Wiesemann)
Grants
  • co-solver of grant 9B22001: Operando metrology for energy storage materials
  • co-solver of grant 8B21001: Pushing boundaries of nano-dimensional metrology by light
  • co-solver of grant 8B18001: Light-matter interplay for optical metrology beyond the classical spatial resolution limits
  • co-solver of grant 8B15001: Advanced 3D chemical metrology for innovative technologies
  • co-solver of grant 7AX15002: Traceable characterisation of thin-film materials for energy applications
  • co-solver of grant 7AX13032: Crystalline surfaces, self assembled structures, and nano-origami as length standards in (nano)metrology
  • co-solver of grant 7AX13018: Novel electronic devices based on control of strain at the nanoscale
  • co-solver of grant 7AX13004: Traceable characterisation of nanostructured devices
  • solver of the FRVŠ 2181/2005 grant: Studium vlastností uhlíkových polymerních vrstev připravovaných v pulzních vysokofrekvenčních doutnavých výbojích
  • co-solver of the FRVŠ 0601/2003 grant: Studium procesů a produktů plazmochemických reakcí
Selected Publications
  • VALTR, Miroslav, Petr KLAPETEK, Jan MARTINEK, Ondrej NOVOTNY, Zdenek JELINEK, Vaclav HORTVIK a David NECAS. Scanning Probe Microscopy controller with advanced sampling support. HardwareX. AMSTERDAM: Elsevier, 2023, roč. 15, 11 s. Dostupné z: https://dx.doi.org/10.1016/j.ohx.2023.e00451. info
  • NECAS, David, Miroslav VALTR a Petr KLAPETEK. How levelling and scan line corrections ruin roughness measurement and how to prevent it. Nature Scientific Reports. BERLIN: NATURE PORTFOLIO, 2020, roč. 10, č. 1, 15 s. ISSN 2045-2322. Dostupné z: https://dx.doi.org/10.1038/s41598-020-72171-8. info
  • MARTINEK, Jan, Miroslav VALTR, Vaclav HORTVIK, Petr GROLICH, Danick BRIAND, Marjan SHAKER a Petr KLAPETEK. Large area scanning thermal microscopy and infrared imaging system. MEASUREMENT SCIENCE & TECHNOLOGY. BRISTOL: IOP PUBLISHING LTD, 2019, roč. 30, č. 3, 12 s. ISSN 0957-0233. Dostupné z: https://dx.doi.org/10.1088/1361-6501/aafa96. info
  • KLAPETEK, Petr, Andrew YACOOT, Petr GROLICH, Miroslav VALTR a David NEČAS. Gwyscan: a library to support non-equidistant Scanning Probe Microscope measurements. Measurement Science and Technology. Bristol: IOP Pub., 2017, roč. 28, č. 3, s. nestránkováno, 11 s. ISSN 0957-0233. Dostupné z: https://dx.doi.org/10.1088/1361-6501/28/3/034015. Plný text u vydavatele info
  • KLAPETEK, Petr, Miroslav VALTR, David NEČAS, Ota SALYK a Petr DZIK. Atomic force microscopy analysis of nanoparticles in non-ideal conditions. Nanoscale Research Letter. New York: Springer, 2011, roč. 6, č. 1, s. "nestránkováno", 9 s. ISSN 1931-7573. Dostupné z: https://dx.doi.org/10.1186/1556-276X-6-514. info
  • KLAPETEK, Petr, Miroslav VALTR a Martin MATULA. A long-range scanning probe microscope for automotive reflector optical quality inspection. MEASUREMENT SCIENCE & TECHNOLOGY. BRISTOL: IOP PUBLISHING LTD, 2011, roč. 22, č. 9, 7 s. ISSN 0957-0233. Dostupné z: https://dx.doi.org/10.1088/0957-0233/22/9/094011. info
  • KLAPETEK, Petr, Miroslav VALTR, Aleš PORUBA, David NEČAS a Miloslav OHLÍDAL. Rough surface scattering simulations using graphics cards. Applied Surface Science. USA: ELSEVIER (NORTH-HOLLAND), 2010, roč. 2010, č. 256, s. 5640-5643. ISSN 0169-4332. info
  • KLAPETEK, Petr a Miroslav VALTR. Near-field optical microscopy simulations using graphics processing units. Surface and Interface Analysis. 2010, roč. 42/2010, č. 6, 5 s. ISSN 1096-9918. info
  • MAN, Jiří, Miroslav VALTR, Anja WEIDNER, Martin PETRENEC, Karel OBRTLÍK a Jaroslav POLÁK. AFM study of surface relief evolution in 316L steel fatigued at low and high temperatures. FATIGUE 2010. 2010, roč. 2010, č. 1, s. 1625-1633. ISSN 1877-7058. info
  • VALTR, Miroslav, Petr KLAPETEK, Vilma BURŠÍKOVÁ, Ivan OHLÍDAL a Daniel FRANTA. Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge. Chem. listy. Praha: Česká společnost chemická, 2008, roč. 102, č. 16, s. 1529-1532. ISSN 0009-2770. URL info
  • VALTR, Miroslav, Petr KLAPETEK, Ivan OHLÍDAL a Daniel FRANTA. UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction. Optoelectronics and Advanced Materials - Rapid Communications. Bucharest: INOE & INFM, 2007, roč. 1, č. 11, s. 620-624. ISSN 1842-6573. URL info
  • VALTR, Miroslav, Ivan OHLÍDAL a Daniel FRANTA. Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry. Czech. J. Phys. Praha: Institute of Physics Academy of Sciences, 2006, roč. 56/2006, Suppl. B, s. 1103 - 1109. ISSN 0011-4626. info

2024/03/22


Curriculum vitae: Mgr. Miroslav Valtr, Ph.D. (učo 13715), version: English(1), last update: 2024/03/22 11:52, M. Valtr

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