| HNILICA, Jaroslav, Jan SCHÄFER, Rüdiger FOEST, Lenka ZAJÍČKOVÁ a Vít KUDRLE. PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure. J. Phys. D: Appl. Phys. 2013, roč. 46, č. 33, s. nestránkováno, 8 s. ISSN 0022-3727. Dostupné z: https://dx.doi.org/10.1088/0022-3727/46/33/335202. |
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@article{1118531,
author = {Hnilica, Jaroslav and Schäfer, Jan and Foest, Rüdiger and Zajíčková, Lenka and Kudrle, Vít},
article_number = {33},
doi = {http://dx.doi.org/10.1088/0022-3727/46/33/335202},
keywords = {PECVD; modulated; microwave; plasma jet; atmospheric pressure},
language = {eng},
issn = {0022-3727},
journal = {J. Phys. D: Appl. Phys.},
title = {PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure},
url = {http://iopscience.iop.org/0022-3727/46/33/335202/},
volume = {46},
year = {2013}
}
TY - JOUR
ID - 1118531
AU - Hnilica, Jaroslav - Schäfer, Jan - Foest, Rüdiger - Zajíčková, Lenka - Kudrle, Vít
PY - 2013
TI - PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure
JF - J. Phys. D: Appl. Phys.
VL - 46
IS - 33
SP - nestránkováno
EP - nestránkováno
SN - 00223727
KW - PECVD
KW - modulated
KW - microwave
KW - plasma jet
KW - atmospheric pressure
UR - http://iopscience.iop.org/0022-3727/46/33/335202/
N2 - We performed the thin films deposition using atmospheric pressure plasma enhanced chemical vapour deposition (AP-PECVD) by means of a microwave plasma jet operating with mixtures of argon and tetrakis(trimethylsilyloxy)silane (TTMS).
ER -
HNILICA, Jaroslav, Jan SCHÄFER, Rüdiger FOEST, Lenka ZAJÍČKOVÁ a Vít KUDRLE. PECVD of nanostructured SiO2 in a modulated microwave plasma jet at atmospheric pressure. \textit{J. Phys. D: Appl. Phys.}. 2013, roč.~46, č.~33, s.~nestránkováno, 8 s. ISSN~0022-3727. Dostupné z: https://dx.doi.org/10.1088/0022-3727/46/33/335202.
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