| PAMREDDY, Annapurna, Dana SKÁCELOVÁ, Martin HANIČINEC, Pavel SŤAHEL, Monika STUPAVSKÁ, Mirko ČERNÁK and Josef HAVEL. Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge. Surface & coatings technology. Elsevier Science, 2013, vol. 236, No 236, p. 326-331. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2013.10.008. |
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@article{1126797,
author = {Pamreddy, Annapurna and Skácelová, Dana and Haničinec, Martin and Sťahel, Pavel and Stupavská, Monika and Černák, Mirko and Havel, Josef},
article_number = {236},
doi = {http://dx.doi.org/10.1016/j.surfcoat.2013.10.008},
keywords = {DCSBD plasma; plasma treatment; surface treatment; silicon wafer; LDI},
language = {eng},
issn = {0257-8972},
journal = {Surface & coatings technology},
title = {Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge},
url = {http://www.sciencedirect.com/science/article/pii/S0257897213009420},
volume = {236},
year = {2013}
}
TY - JOUR
ID - 1126797
AU - Pamreddy, Annapurna - Skácelová, Dana - Haničinec, Martin - Sťahel, Pavel - Stupavská, Monika - Černák, Mirko - Havel, Josef
PY - 2013
TI - Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge
JF - Surface & coatings technology
VL - 236
IS - 236
SP - 326-331
EP - 326-331
PB - Elsevier Science
SN - 02578972
KW - DCSBD plasma
KW - plasma treatment
KW - surface treatment
KW - silicon wafer
KW - LDI
UR - http://www.sciencedirect.com/science/article/pii/S0257897213009420
N2 - Surface of crystalline silicon (c-Si) wafers was treated in dielectric barrier discharge and the cleaning effect, wettability and adhesion of gold nanoparticles were investigated. Treatment of c-Si was realised in air plasma at atmospheric pressure in Diffuse Coplanar Surface Barrier Discharge (DCSBD). Plasma cleaning and gold nanoparticles adhesion were investigated by means of Laser Desorption Ionisation Time Of Flight Mass Spectrometry (LDI TOF MS) and X-ray photoelectron spectroscopy (XPS). Wettability and surface morphology were studied by contact angle measurement and atomic force microscopy, respectively. By laser desorption in positive ion mode, Cn+ and Na+, K+, etc. ions were detected on the industrially cleaned surface of silicon wafers. After plasma treatment the substantial decrease of such ions was observed. Plasma treatment of the surface increased also its hydrophilicity and adsorption of gold nanoparticles on the Si surface significantly increased after 5 sec cleaning in plasma. Intensity of gold clusters Aun+ absorbed on the plasma treated Si surface was in order of magnitude higher than intensity of clusters absorbed on the untreated surface.
ER -
PAMREDDY, Annapurna, Dana SKÁCELOVÁ, Martin HANIČINEC, Pavel SŤAHEL, Monika STUPAVSKÁ, Mirko ČERNÁK and Josef HAVEL. Plasma cleaning and activation of silicon surface in Dielectric Coplanar Surface Barrier Discharge. \textit{Surface \&{} coatings technology}. Elsevier Science, 2013, vol.~236, No~236, p.~326-331. ISSN~0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2013.10.008.
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