BURŠÍKOVÁ, Vilma, Marie HARTMANOVÁ, Vladislav NAVRÁTIL and C. MANSILLA. Influence of deposition conditions on electrical and mechanical properties of Sm2O3 doped CeO2 thin films prepared by EB-PVD (+IBAD) methods part 2. Indentation hardness and effective elastic modulus. Russian Journal of Electrochemistry. Pleiades Publishing, Ltd., 2013, vol. 49, No 7, p. 619-627. ISSN 1023-1935. Available from: https://dx.doi.org/10.1134/S1023193513070033.
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Basic information
Original name Influence of deposition conditions on electrical and mechanical properties of Sm2O3 doped CeO2 thin films prepared by EB-PVD (+IBAD) methods part 2. Indentation hardness and effective elastic modulus
Name in Czech Vliv depozičních podmínek na elektrické a mechanické vlastností tenkých CeO2 vrstev dopovaných s Sm2O3 připravených metodami EB-PVD (+IBAD) 2. část Indentační tvrdost a efektivní elastický modul
Authors BURŠÍKOVÁ, Vilma (203 Czech Republic, guarantor, belonging to the institution), Marie HARTMANOVÁ (703 Slovakia), Vladislav NAVRÁTIL (203 Czech Republic, belonging to the institution) and C. MANSILLA (724 Spain).
Edition Russian Journal of Electrochemistry, Pleiades Publishing, Ltd. 2013, 1023-1935.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher Russian Federation
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 0.660
RIV identification code RIV/00216224:14310/13:00070881
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1134/S1023193513070033
UT WoS 000321773800003
Keywords (in Czech) mechanické vlastnosti; tvrdost; elastický modul; nanoindentace; tenké vrstvy; CeO2; Sm2O3; dopování
Keywords in English mechanical properties; hardness; elastic modulus; nanoindentation; thin films; CeO2; Sm2O3; doping
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: Dana Nesnídalová, učo 831. Changed: 1/4/2019 12:24.
Abstract
The study of polycrystalline CeO2 + xSm2O3 (x = 0, 10.9–15.9 mol %) thin films deposited by Electron Beam Physical Vapour Deposition (EBPVD) and Ionic Beam Assisted Deposition (IBAD) techniques on the Si substrate was devoted to the influence of deposition conditions used, namely composition x, deposition temperature Tdep and Ar+ ion bombardment, on the (micro)hardness, Hpl and elastic modulus,Y with respect to the film structure and microstructure. These mechanical characteristics were investigated by the instrumented indentation technique as the functions of relative indentation depth hrel = hmax/t and the values obtained were compared with those obtained by the classical Vickers technique. Results of this study are described and discussed.
Abstract (in Czech)
Práce byla zaměřená na studium polykrystalických tenkých vrstev CeO2 + xSm2O3 (x = 0, 10.9–15.9 mol %) deponovaných metodou EBPVD a IBAD technikami na křemíkové substráty. Soustředí se hlavně na stanovení vlivu depozičních podmínek, jako jsou složení x, depoziční teplota Tdep a iontový bombard Ar+ , na (mikro)tvrdost (micro), Hpl a elastický modul,Y s ohledem na struktura a složení vrstev. Tyto mechanické charakteristiky byly studovány metodou instrumentované vtiskové zkoušky. Hodnoty tvrdostí byly srovnávány s hodnotami obdrženými na základě klasické Vickersovy zkoušky.
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