2015
Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D fluid model
OBRUSNÍK, Adam a Zdeněk BONAVENTURAZákladní údaje
Originální název
Studying a low-pressure microwave coaxial discharge in hydrogen using a mixed 2D/3D fluid model
Autoři
OBRUSNÍK, Adam (203 Česká republika, domácí) a Zdeněk BONAVENTURA (203 Česká republika, garant, domácí)
Vydání
Journal of physics D: Applied physics, Bristol, England, IOP Publishing Ltd. 2015, 0022-3727
Další údaje
Jazyk
angličtina
Typ výsledku
Článek v odborném periodiku
Obor
10305 Fluids and plasma physics
Stát vydavatele
Velká Británie a Severní Irsko
Utajení
není předmětem státního či obchodního tajemství
Odkazy
Impakt faktor
Impact factor: 2.772
Kód RIV
RIV/00216224:14310/15:00080658
Organizační jednotka
Přírodovědecká fakulta
UT WoS
000348842600006
Klíčová slova anglicky
microwave plasma; hydrogen; low-pressure; fluid model; coaxial discharge; plasmaline; nanocrystalline diamond
Příznaky
Mezinárodní význam, Recenzováno
Změněno: 12. 4. 2016 13:32, Ing. Andrea Mikešková
Anotace
V originále
This work presents a numerical model of hydrogen plasma in a microwave coaxial discharge at low pressure (25–250 Pa). The model is a mixed two-dimensional (2D)/three-dimensional (3D) model in that it combines three-dimensional geometry for the electromagnetic field and two-dimensional geometry for the transport equations. The model is validated against experimental results available in the literature and, where possible, simulations of comparable discharges. The model shows reasonable agreement in the relevant pressure range. A parametric study with respect to pressure is carried out and it is observed that the plasma contracts towards the quartz tube with increasing pressure. Increasing the pressure also influences the abundance of H + ions but on the other hand it has little impact on hydrogen dissociation degree and electron temperature. Furthermore, the uniformity of the plasma above the substrate holder is analyzed. It is observed that at pressures over 150 Pa, the plasma gets non-uniform in the direction parallel to the plasma lines. Finally, the uniformity of particle and energy fluxes to the substrate holder are analyzed. Knowing the fluxes is especially useful for the material applications of the device.
Návaznosti
GAP205/12/0908, projekt VaV |
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