ZÁPRAŽNÝ, Z., D. KORYTÁR, P. ŠIFFALOVIČ, M. JERGEL, M. DEMYDENKO, Petr MIKULÍK, E. DOBROČKA, C. FERRARI, P. VAGOVIČ a M. MIKLOŠKA. Simulations and surface quality testing of high asymmetry angle X-ray crystal monochromators for advanced X-ay imaging applications. In C. Morawe, A. Khounsary, and S. Goto. Advances in X-Ray/EUV Optics and Components IX. 9207. vyd. USA: SPIE-INT SOC OPTICAL ENGINEERING, 2014, s. "nestránkováno", 14 s. ISBN 978-1-62841-234-5. Dostupné z: https://dx.doi.org/10.1117/12.2061353.
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Základní údaje
Originální název Simulations and surface quality testing of high asymmetry angle X-ray crystal monochromators for advanced X-ay imaging applications
Autoři ZÁPRAŽNÝ, Z. (703 Slovensko), D. KORYTÁR (703 Slovensko), P. ŠIFFALOVIČ (703 Slovensko), M. JERGEL (703 Slovensko), M. DEMYDENKO (703 Slovensko), Petr MIKULÍK (643 Rusko, garant, domácí), E. DOBROČKA (703 Slovensko), C. FERRARI (380 Itálie), P. VAGOVIČ (703 Slovensko) a M. MIKLOŠKA (703 Slovensko).
Vydání 9207. vyd. USA, Advances in X-Ray/EUV Optics and Components IX, od s. "nestránkováno", 14 s. 2014.
Nakladatel SPIE-INT SOC OPTICAL ENGINEERING
Další údaje
Originální jazyk angličtina
Typ výsledku Stať ve sborníku
Obor 10302 Condensed matter physics
Stát vydavatele Spojené státy
Utajení není předmětem státního či obchodního tajemství
Forma vydání tištěná verze "print"
WWW URL
Kód RIV RIV/00216224:14740/14:00079915
Organizační jednotka Středoevropský technologický institut
ISBN 978-1-62841-234-5
ISSN 0277-786X
Doi http://dx.doi.org/10.1117/12.2061353
UT WoS 000343877600030
Klíčová slova anglicky Crystals ; Monochromators ; Simulations ; Surface quality testing ; X-ray imaging ; X-rays ; Germanium ; Single point diamond turning ; Polishing ; Reflectivity
Štítky rivok
Příznaky Mezinárodní význam, Recenzováno
Změnil Změnila: Martina Prášilová, učo 342282. Změněno: 28. 4. 2015 12:48.
Anotace
Advanced X-ray imaging techniques of weakly absorbing structures require an increase of the sensitivity to small refractive angles considering that they are based more on coherent X-ray phase contrast than on X-ray absorption one. Simulations of diffraction properties of germanium (Ge) X-ray crystal monochromators and of analyzer based imaging (ABI) method were performed for various asymmetry factors and several lattice plane orientations using an X-ray energy range from 8 keV to 20 keV. Using an appropriate phase/amplitude retrieval method one can recover the phase information from the ABI image, which is directly proportional to the projected electron density. We are using germanium based optics for X-ray imaging or image magnification. The use of Ge crystals offers several advantages over silicon crystals. The integrated reflectivity of Ge crystals is two to three times larger than that of Si crystals. The spatial resolution of Ge magnifiers is typically two times better than the spatial resolution of Si magnifiers. We used high asymmetry diffractions to increase effectively the propagation distance and decrease the effective pixel size of the detector, to achieve a sufficient magnification of the sample and to improve coherence and increase output intensity. The most important parameter of a highly asymmetric monochromators as image magnifiers is the crystal surface quality. We have applied several crystal surface finishing methods including conventional mechanical lapping, chemical polishing, chemo-mechanical polishing and advanced nano-machining using single point diamond turning (SPDT), and we have evaluated these methods by means of AFM, diffractometry, reciprocal space mapping and others.
Návaznosti
ED1.1.00/02.0068, projekt VaVNázev: CEITEC - central european institute of technology
VytisknoutZobrazeno: 8. 5. 2024 04:51