KLEIN, Peter, Jaroslav HNILICA, Zdeněk HUBIČKA, Martin ČADA and Petr VAŠINA. Spoke induced cathode voltage and discharge current oscillations in HiPIMS. In 22nd International Symposium on Plasma Chemistry. 2015.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Spoke induced cathode voltage and discharge current oscillations in HiPIMS
Authors KLEIN, Peter (703 Slovakia, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Zdeněk HUBIČKA (203 Czech Republic), Martin ČADA (203 Czech Republic) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution).
Edition 22nd International Symposium on Plasma Chemistry, 2015.
Other information
Original language English
Type of outcome Conference abstract
Field of Study 10305 Fluids and plasma physics
Country of publisher Belgium
Confidentiality degree is not subject to a state or trade secret
WWW URL
RIV identification code RIV/00216224:14310/15:00080975
Organization unit Faculty of Science
Keywords in English HiPIMS; spokes; magnetron sputtering; plasma instabilities
Changed by Changed by: doc. Mgr. Jaroslav Hnilica, Ph.D., učo 106259. Changed: 7/12/2015 11:06.
Abstract
The oscillations were observed on cathode voltage and discharge current temporal evolution in HiPIMS pulse. The frequency of the oscillations depends at given pressure only on actual value of the discharge current. Rotation of the spokes over the cathode and the frequency of the oscillations shows different trends. The oscillations are observed at conditions where at least certain critical amount of spokes emerges.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GAP205/12/0407, research and development projectName: Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev
Investor: Czech Science Foundation
GA15-00863S, research and development projectName: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
PrintDisplayed: 30/5/2024 20:58