Determination of titanium atom and ion densities in sputter
deposition plasmas by optical emission spectroscopy

J 2015

Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

VAŠINA, Petr, Matej FEKETE, Jaroslav HNILICA, Peter KLEIN, Lenka DOSOUDILOVÁ et. al.

Základní údaje

Originální název

Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy

Autoři

VAŠINA, Petr (203 Česká republika, garant, domácí), Matej FEKETE (703 Slovensko, domácí), Jaroslav HNILICA (203 Česká republika, domácí), Peter KLEIN (703 Slovensko, domácí), Lenka DOSOUDILOVÁ (203 Česká republika, domácí), Pavel DVOŘÁK (203 Česká republika, domácí) a Zdeněk NAVRÁTIL (203 Česká republika, domácí)

Vydání

Plasma Sources Science and Technology, 2015, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 2.808

Kód RIV

RIV/00216224:14310/15:00081243

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1088/0963-0252/24/6/065022

UT WoS

000368117100027

Klíčová slova anglicky

sputter species density; magnetron; HIPIMS; plasma diagnostics; titanium

Štítky

AKR, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 13. 3. 2018 11:55, doc. Mgr. Zdeněk Navrátil, Ph.D.

Anotace

V originále

The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered titanium atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant titanium atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of titanium atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.

Návaznosti

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

GA15-00863S, projekt VaV

Název: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace

Investor: Grantová agentura ČR, Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

VAŠINA, Petr, Matej FEKETE, Jaroslav HNILICA, Peter KLEIN, Lenka DOSOUDILOVÁ, Pavel DVOŘÁK a Zdeněk NAVRÁTIL. Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy. Plasma Sources Science and Technology. 2015, roč. 24, č. 6, s. "nestránkováno", 13 s. ISSN 0963-0252. Dostupné z: https://dx.doi.org/10.1088/0963-0252/24/6/065022.

@article{1318794,
   author = {Vašina, Petr and Fekete, Matej and Hnilica, Jaroslav and Klein, Peter and Dosoudilová, Lenka and Dvořák, Pavel and Navrátil, Zdeněk},
   article_number = {6},
   doi = {http://dx.doi.org/10.1088/0963-0252/24/6/065022},
   keywords = {sputter species density; magnetron; HIPIMS; plasma diagnostics; titanium},
   language = {eng},
   issn = {0963-0252},
   journal = {Plasma Sources Science and Technology},
   title = {Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy},
   url = {http://iopscience.iop.org/article/10.1088/0963-0252/24/6/065022},
   volume = {24},
   year = {2015}
}

TY  - JOUR
ID  - 1318794
AU  - Vašina, Petr - Fekete, Matej - Hnilica, Jaroslav - Klein, Peter - Dosoudilová, Lenka - Dvořák, Pavel - Navrátil, Zdeněk
PY  - 2015
TI  - Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy
JF  - Plasma Sources Science and Technology
VL  - 24
IS  - 6
SP  - "nestránkováno"
EP  - "nestránkováno"
SN  - 09630252
KW  - sputter species density
KW  - magnetron
KW  - HIPIMS
KW  - plasma diagnostics
KW  - titanium
UR  - http://iopscience.iop.org/article/10.1088/0963-0252/24/6/065022
N2  - The thorough characterizations of deposition plasma lead to important achievements in the fundamental understanding of the deposition process, with a clear impact on the development of technology. Measurement of the spatial and, in the case of pulse excited plasma, also temporal evolution, of the concentrations of sputtered atoms and ions is a primary task in the diagnostics of any sputter deposition plasma. However, it is difficult to estimate absolute number densities of the sputtered species (atoms and ions) in ground states directly from optical emission spectroscopy, because the species in the ground levels do not produce any optical signal. A method using effective branching fractions enables us to determine the density of non-radiating species from the intensities of self-absorbed spectral lines. The branching fractions method described in the first part of this paper was applied to determine the ground state densities of the sputtered titanium atoms and ions. The method is based on fitting the theoretically calculated branching fractions to experimentally measured ratios of the relative intensities of carefully selected resonant titanium atomic and ionic lines. The sputtered species density is determined in our experimental setup with a relative uncertainty of less than 5% for the dc driven magnetron and typically 15% for time-resolved measurements of high- power impulse magnetron sputtering (HiPIMS) discharge. In the second part of the paper, the method was applied to determine the evolution of titanium atom and ion densities in three typical cases ranging from the dc driven sputter process to HiPIMS.
ER  -

VAŠINA, Petr, Matej FEKETE, Jaroslav HNILICA, Peter KLEIN, Lenka DOSOUDILOVÁ, Pavel DVOŘÁK a Zdeněk NAVRÁTIL. Determination of titanium atom and ion densities in sputter deposition plasmas by optical emission spectroscopy. \textit{Plasma Sources Science and Technology}. 2015, roč.~24, č.~6, s.~''nestránkováno'', 13 s. ISSN~0963-0252. Dostupné z: https://dx.doi.org/10.1088/0963-0252/24/6/065022.

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