Influence of deposition conditions on electrical and mechanical
properties of Sm2O3-doped CeO2 thin films prepared by EB-PVD (
plus IBAD) methods. Relationship between investigated film and
substrate at indentation

J 2015

Influence of deposition conditions on electrical and mechanical properties of Sm2O3-doped CeO2 thin films prepared by EB-PVD ( plus IBAD) methods. Relationship between investigated film and substrate at indentation

BURŠÍKOVÁ, Vilma, Maria HARTMANOVÁ, Vladislav NAVRÁTIL a C. MANSILLA

Základní údaje

Originální název

Influence of deposition conditions on electrical and mechanical properties of Sm2O3-doped CeO2 thin films prepared by EB-PVD ( plus IBAD) methods. Relationship between investigated film and substrate at indentation

Autoři

BURŠÍKOVÁ, Vilma (203 Česká republika, garant, domácí), Maria HARTMANOVÁ (703 Slovensko), Vladislav NAVRÁTIL (203 Česká republika, domácí) a C. MANSILLA (724 Španělsko)

Vydání

Russian Journal of Electrochemistry, NEW YORK, MAIK NAUKA/INTERPERIODICA/SPRINGER, 2015, 1023-1935

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10405 Electrochemistry

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 0.692

Kód RIV

RIV/00216224:14410/15:00086919

Organizační jednotka

Pedagogická fakulta

DOI

http://dx.doi.org/10.1134/S102319351506004X

UT WoS

000356494600001

Klíčová slova česky

CeO2-Sm2O3 vrstvy; Si-substrát; EB-PVD; nanoindentace; differenciální tvrdost

Klíčová slova anglicky

CeO2-Sm2O3 films; Si-substrate; electron-beam physical vapour deposition; ionic beam assisted deposition; depth sensing indentation; differential hardness

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 1. 4. 2019 12:18, Dana Nesnídalová

Anotace

V originále

The study of polycrystalline CeO2 + xSm(2)O(3) (x = 0, 10.9-15.9 mol %) thin films deposited by Electron Beam Physical Vapour Deposition (EB-PVD) and Ionic Beam Assisted Deposition (IBAD) techniques on the Si substrate was devoted to the influence of deposition conditions used, namely composition x, deposition temperature T (dep) and Ar+ ion bombardment as well as the structure and (micro)structure on the (micro)hardness H using the differential hardness, Hdif, as a parameter. The investigations were made using, as in our recent papers, the depth sensing indentation (DSI) technique. The study was focused on the depth dependence of the film/substrate system response on the indentation response from the surface of films up to the film/substrate interface. This study has shown that the critical indentation depth, where the influence of substrate is negligible, can be observed for some CeO2 films doped with Sm2O3 as well as for undoped CeO2 films, both deposited at T-dep = 200A degrees C without IBAD as well as using IBAD. Besides it, a wavy character of differential curve due to the inhomogeneities of films was observed with good reproducibility at some films. It was proven, that the method of differential hardness measurement is applicable for the determination of critical indentation depth as well as for the study of microstructure response of thin films from the film surface up to the film/substrate interface. Results of this study are described and discussed.

Návaznosti

ED1.1.00/02.0068, projekt VaV

Název: CEITEC - central european institute of technology

Citovat

BURŠÍKOVÁ, Vilma, Maria HARTMANOVÁ, Vladislav NAVRÁTIL a C. MANSILLA. Influence of deposition conditions on electrical and mechanical properties of Sm2O3-doped CeO2 thin films prepared by EB-PVD ( plus IBAD) methods. Relationship between investigated film and substrate at indentation. Russian Journal of Electrochemistry. NEW YORK: MAIK NAUKA/INTERPERIODICA/SPRINGER, 2015, roč. 51, č. 6, s. 495-502. ISSN 1023-1935. Dostupné z: https://dx.doi.org/10.1134/S102319351506004X.

@article{1338512,
   author = {Buršíková, Vilma and Hartmanová, Maria and Navrátil, Vladislav and Mansilla, C.},
   article_location = {NEW YORK},
   article_number = {6},
   doi = {http://dx.doi.org/10.1134/S102319351506004X},
   keywords = {CeO2-Sm2O3 films; Si-substrate; electron-beam physical vapour deposition; ionic beam assisted deposition; depth sensing indentation; differential hardness},
   language = {eng},
   issn = {1023-1935},
   journal = {Russian Journal of Electrochemistry},
   title = {Influence of deposition conditions on electrical and mechanical properties of Sm2O3-doped CeO2 thin films prepared by EB-PVD ( plus IBAD) methods. Relationship between investigated film and substrate at indentation},
   url = {http://link.springer.com/article/10.1134%2FS102319351506004X},
   volume = {51},
   year = {2015}
}

TY  - JOUR
ID  - 1338512
AU  - Buršíková, Vilma - Hartmanová, Maria - Navrátil, Vladislav - Mansilla, C.
PY  - 2015
TI  - Influence of deposition conditions on electrical and mechanical properties of Sm2O3-doped CeO2 thin films prepared by EB-PVD ( plus IBAD) methods. Relationship between investigated film and substrate at indentation
JF  - Russian Journal of Electrochemistry
VL  - 51
IS  - 6
SP  - 495-502
EP  - 495-502
PB  - MAIK NAUKA/INTERPERIODICA/SPRINGER
SN  - 10231935
KW  - CeO2-Sm2O3 films
KW  - Si-substrate
KW  - electron-beam physical vapour deposition
KW  - ionic beam assisted deposition
KW  - depth sensing indentation
KW  - differential hardness
UR  - http://link.springer.com/article/10.1134%2FS102319351506004X
L2  - http://link.springer.com/article/10.1134%2FS102319351506004X
N2  - The study of polycrystalline CeO2 + xSm(2)O(3) (x = 0, 10.9-15.9 mol %) thin films deposited by Electron Beam Physical Vapour Deposition (EB-PVD) and Ionic Beam Assisted Deposition (IBAD) techniques on the Si substrate was devoted to the influence of deposition conditions used, namely composition x, deposition temperature T (dep) and Ar+ ion bombardment as well as the structure and (micro)structure on the (micro)hardness H using the differential hardness, Hdif, as a parameter. The investigations were made using, as in our recent papers, the depth sensing indentation (DSI) technique. The study was focused on the depth dependence of the film/substrate system response on the indentation response from the surface of films up to the film/substrate interface. This study has shown that the critical indentation depth, where the influence of substrate is negligible, can be observed for some CeO2 films doped with Sm2O3 as well as for undoped CeO2 films, both deposited at T-dep = 200A degrees C without IBAD as well as using IBAD. Besides it, a wavy character of differential curve due to the inhomogeneities of films was observed with good reproducibility at some films. It was proven, that the method of differential hardness measurement is applicable for the determination of critical indentation depth as well as for the study of microstructure response of thin films from the film surface up to the film/substrate interface. Results of this study are described and discussed.
ER  -

BURŠÍKOVÁ, Vilma, Maria HARTMANOVÁ, Vladislav NAVRÁTIL a C. MANSILLA. Influence of deposition conditions on electrical and mechanical properties of Sm2O3-doped CeO2 thin films prepared by EB-PVD ( plus IBAD) methods. Relationship between investigated film and substrate at indentation. \textit{Russian Journal of Electrochemistry}. NEW YORK: MAIK NAUKA/INTERPERIODICA/SPRINGER, 2015, roč.~51, č.~6, s.~495-502. ISSN~1023-1935. Dostupné z: https://dx.doi.org/10.1134/S102319351506004X.

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