| SAMPATH, Sridhar, Philipp MAYDANNIK, Tatiana IVANOVA, Tomáš HOMOLA, Mika SILLANPAA, Rameshbabu NAGUMOTHU a Viswanathan ALAGAN. Structural and morphological characterization of Al2O3 coated macro-porous silicon by atomic layer deposition. Thin Solid Films. 2016, roč. 616, October, s. 628-634. ISSN 0040-6090. Dostupné z: https://dx.doi.org/10.1016/j.tsf.2016.09.026. |
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@article{1355392,
author = {Sampath, Sridhar and Maydannik, Philipp and Ivanova, Tatiana and Homola, Tomáš and Sillanpaa, Mika and Nagumothu, Rameshbabu and Alagan, Viswanathan},
article_number = {October},
doi = {http://dx.doi.org/10.1016/j.tsf.2016.09.026},
keywords = {Electrochemical anodization;Atomic layer deposition;Porous silicon;Conformal coating;Band gap energy},
language = {eng},
issn = {0040-6090},
journal = {Thin Solid Films},
title = {Structural and morphological characterization of Al2O3 coated macro-porous silicon by atomic layer deposition},
url = {http://www.sciencedirect.com/science/article/pii/S004060901630534X},
volume = {616},
year = {2016}
}
TY - JOUR
ID - 1355392
AU - Sampath, Sridhar - Maydannik, Philipp - Ivanova, Tatiana - Homola, Tomáš - Sillanpaa, Mika - Nagumothu, Rameshbabu - Alagan, Viswanathan
PY - 2016
TI - Structural and morphological characterization of Al2O3 coated macro-porous silicon by atomic layer deposition
JF - Thin Solid Films
VL - 616
IS - October
SP - 628-634
EP - 628-634
SN - 00406090
KW - Electrochemical anodization;Atomic layer deposition;Porous silicon;Conformal coating;Band gap energy
UR - http://www.sciencedirect.com/science/article/pii/S004060901630534X
L2 - http://www.sciencedirect.com/science/article/pii/S004060901630534X
N2 - In the present study, Al2O3 coated on macro-porous silicon (m-PS) is prepared by atomic layer deposition (ALD) whereas m-PS is prepared by electrochemical anodization of P type silicon (100) with current density of 15 mA/cm2. Field emission scanning electron microscopy analysis shows Al2O3 nanoparticles with size of ~ 100 nm are conformally coated on m-PS. The surface chemistry and formation mechanism of ALD of Al2O3 (ALD-Al2O3) on m-PS are demonstrated in detail. Optical profilometer results of Al2O3/m-PS confirm conformality of Al2O3 coating on m-PS because the surface amplitude parameter values of m-PS are decreased after ALD-Al2O3. Fourier Transform Infrared analysis confirms that unstable Si-H species of m-PS are replaced with stable Si-Al species. X-ray photoelectron spectroscopy (XPS) analysis of Al2O3/m-PS is carried out for chemical analysis and band gap energy measurement of Al2O3. The XPS survey spectrum shows that fluorine peak is also evolved along with Al, O and C elements which confirm that m-PS surface consists of fluorine. The band gap energy of Al2O3 coating is calculated as 6.91 eV from analysis of high resolution O 1s spectrum.
ER -
SAMPATH, Sridhar, Philipp MAYDANNIK, Tatiana IVANOVA, Tomáš HOMOLA, Mika SILLANPAA, Rameshbabu NAGUMOTHU a Viswanathan ALAGAN. Structural and morphological characterization of Al2O3 coated macro-porous silicon by atomic layer deposition. \textit{Thin Solid Films}. 2016, roč.~616, October, s.~628-634. ISSN~0040-6090. Dostupné z: https://dx.doi.org/10.1016/j.tsf.2016.09.026.
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