FEKETE, Matej, Jaroslav HNILICA, Catalin VITELARU, Tiberiu MINEA and Petr VAŠINA. Time resolved study of Ti sputtered species number densities in multi-pulse HiPIMS discharge. In Fifteenth International Conference on Reactive Sputter Deposition 2016. 2016.
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Basic information
Original name Time resolved study of Ti sputtered species number densities in multi-pulse HiPIMS discharge
Authors FEKETE, Matej (703 Slovakia, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Catalin VITELARU (642 Romania), Tiberiu MINEA (250 France) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution).
Edition Fifteenth International Conference on Reactive Sputter Deposition 2016, 2016.
Other information
Original language English
Type of outcome Conference abstract
Field of Study 10305 Fluids and plasma physics
Country of publisher Belgium
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/16:00088421
Organization unit Faculty of Science
Keywords in English HiPIMS; OES; titanium
Tags International impact
Changed by Changed by: Mgr. Matej Fekete, Ph.D., učo 376265. Changed: 10/7/2017 14:53.
Abstract
A technique based on effective branching fractions was extended to determine the absolute ground state number densities of Ti atoms and Ti ions. The effective branching method was cross validated by TD-LAS technique while studying the dc magnetron sputtering discharge. Influence of preceding pulse on the subsequent pulse in the m-HiPIMS mode was examined as a function of delay (200µs, 400µs and 1500µs) between two successive pulses for the pulse duration of 200µs.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA15-00863S, research and development projectName: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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