BITTNEROVÁ, Štěpánka, Vilma BURŠÍKOVÁ and Monika STUPAVSKÁ. NITROGEN DOPED ORGANOSILICON PLASMA POLYMERS FOR BIOAPPLICATIONS. In Proceedings CECE 2016. 2016. ISBN 978-80-904959-4-4.
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Basic information
Original name NITROGEN DOPED ORGANOSILICON PLASMA POLYMERS FOR BIOAPPLICATIONS
Name in Czech Dusíkem dopované organosilikonové plazmové polymery pro bioaplikace
Authors BITTNEROVÁ, Štěpánka (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, guarantor, belonging to the institution) and Monika STUPAVSKÁ (703 Slovakia, belonging to the institution).
Edition Proceedings CECE 2016, 2016.
Other information
Original language English
Type of outcome Conference abstract
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
WWW URL
RIV identification code RIV/00216224:14310/16:00095983
Organization unit Faculty of Science
ISBN 978-80-904959-4-4
Keywords (in Czech) plazmové polymery; hexamethyldisiloxan; PECVD
Keywords in English plasma polymers; hexamethyldisiloxane; PECVD
Changed by Changed by: doc. RNDr. Vilma Buršíková, Ph.D., učo 2418. Changed: 15/3/2018 10:09.
Abstract
The aim of the present work was to prepare organosilicon thin films with amine functionalities on single crystalline silicon substrates using plasma enhanced chemical 81 vapor deposition (PECVD). The film properties prospective for bioapplications (surface free energy, resistance against mechanical damage, chemical composition, i.e. the presence of primary and secondary amines) were studied.
Abstract (in Czech)
Cílem práce bylo připravit organokřemičité tenké filmy s aminovými funkčními skupinami na substrátech monokrystalického křemíku za použití plazmatické depozice chemických par (PECVD). Vlastnosti filmu jsou prospěšné pro biologické aplikace (povrchová volná energie, odolnost proti mechanickému poškození, chemické složení, tj.přítomnost primárních a sekundárních aminů).
Links
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
PrintDisplayed: 29/5/2024 01:04