Wide spectral range characterization of antireflective coatings
and their optimization

D 2015

Wide spectral range characterization of antireflective coatings and their optimization

FRANTA, Daniel, David NEČAS, Ivan OHLÍDAL a Jiří JANKUJ

Základní údaje

Originální název

Wide spectral range characterization of antireflective coatings and their optimization

Název česky

Charakterizace antiodrazných pokrytí a jejich optimalizace v širokém spektrálním oboru

Autoři

FRANTA, Daniel (203 Česká republika, garant, domácí), David NEČAS (203 Česká republika, domácí), Ivan OHLÍDAL (203 Česká republika, domácí) a Jiří JANKUJ (203 Česká republika)

Vydání

9628. vyd. BELLINGHAM, USA, Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, od s. "96280F-1"-"96280F-14", 14 s. 2015

Nakladatel

SPIE-INT SOC OPTICAL ENGINEERING

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

10302 Condensed matter physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Forma vydání

tištěná verze "print"

Kód RIV

RIV/00216224:14310/15:00094361

Organizační jednotka

Přírodovědecká fakulta

ISBN

978-1-62841-817-0

ISSN

DOI

http://dx.doi.org/10.1117/12.2190109

UT WoS

000366832100006

Klíčová slova anglicky

antireflective coatings; optical thin films; ellipsometry; spectrophotometry

Štítky

NZ, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 18. 4. 2018 14:31, Mgr. Michal Petr

Anotace

V originále

Development of antireflective coatings realized by thin film systems requires their characterization and optimization of their properties. Functional properties of such interference devices are determined by optical constants and thicknesses of the individual films and various defects taking place in these systems. In optics industry the characterization of the films is mostly performed in a relatively narrow spectral range using simple dispersion models and, moreover, the defects are not taken into account at all. This manner of characterization fails if applied to real-world non-ideal thin film systems because the measured data do not contain sufficient information about all the parameters describing the system including imperfections. Reliable characterization requires the following changes: extension of spectral range of measurements, combination of spectrophotometry and ellipsometry, utilization of physically correct dispersion models (Kramers-Kronig consistency, sum rules), inclusion of structural defects instrument imperfection into the models and simultaneous processing of all experimental data. This enables us to remove or reduce a correlation among the parameters searched so that correct and sufficiently precise determination of parameter values is achieved. Since the presence and properties of the defects are difficult to control independently by tuning of the deposition conditions, the optimization does not in general involve the elimination of defects. Instead they are taken into account in the design of the film systems. The outlined approach is demonstrated on the characterization and optimization of ultraviolet antireflective coating formed by double layer of Al2O3 and MgF2 deposited on fused silica.

Návaznosti

ED1.1.00/02.0068, projekt VaV

Název: CEITEC - central european institute of technology

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

TA02010784, projekt VaV

Název: Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Investor: Technologická agentura ČR, Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Citovat

FRANTA, Daniel, David NEČAS, Ivan OHLÍDAL a Jiří JANKUJ. Wide spectral range characterization of antireflective coatings and their optimization. In Duparre, A; Geyl, R. Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V. 9628. vyd. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, s. "96280F-1"-"96280F-14", 14 s. ISBN 978-1-62841-817-0. Dostupné z: https://dx.doi.org/10.1117/12.2190109.

@inproceedings{1384151,
   author = {Franta, Daniel and Nečas, David and Ohlídal, Ivan and Jankuj, Jiří},
   address = {BELLINGHAM, USA},
   booktitle = {Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V},
   doi = {http://dx.doi.org/10.1117/12.2190109},
   edition = {9628},
   editor = {Duparre, A; Geyl, R},
   keywords = {antireflective coatings; optical thin films; ellipsometry; spectrophotometry},
   howpublished = {tištěná verze "print"},
   language = {eng},
   location = {BELLINGHAM, USA},
   isbn = {978-1-62841-817-0},
   pages = {"96280F-1"-"96280F-14"},
   publisher = {SPIE-INT SOC OPTICAL ENGINEERING},
   title = {Wide spectral range characterization of antireflective coatings and their optimization},
   year = {2015}
}

TY  - JOUR
ID  - 1384151
AU  - Franta, Daniel - Nečas, David - Ohlídal, Ivan - Jankuj, Jiří
PY  - 2015
TI  - Wide spectral range characterization of antireflective coatings and their optimization
PB  - SPIE-INT SOC OPTICAL ENGINEERING
CY  - BELLINGHAM, USA
SN  - 9781628418170
KW  - antireflective coatings
KW  - optical thin films
KW  - ellipsometry
KW  - spectrophotometry
N2  - Development of antireflective coatings realized by thin film systems requires their characterization and optimization of their properties. Functional properties of such interference devices are determined by optical constants and thicknesses of the individual films and various defects taking place in these systems. In optics industry the characterization of the films is mostly performed in a relatively narrow spectral range using simple dispersion models and, moreover, the defects are not taken into account at all. This manner of characterization fails if applied to real-world non-ideal thin film systems because the measured data do not contain sufficient information about all the parameters describing the system including imperfections. Reliable characterization requires the following changes: extension of spectral range of measurements, combination of spectrophotometry and ellipsometry, utilization of physically correct dispersion models (Kramers-Kronig consistency, sum rules), inclusion of structural defects instrument imperfection into the models and simultaneous processing of all experimental data. This enables us to remove or reduce a correlation among the parameters searched so that correct and sufficiently precise determination of parameter values is achieved. Since the presence and properties of the defects are difficult to control independently by tuning of the deposition conditions, the optimization does not in general involve the elimination of defects. Instead they are taken into account in the design of the film systems. The outlined approach is demonstrated on the characterization and optimization of ultraviolet antireflective coating formed by double layer of Al2O3 and MgF2 deposited on fused silica.
ER  -

FRANTA, Daniel, David NEČAS, Ivan OHLÍDAL a Jiří JANKUJ. Wide spectral range characterization of antireflective coatings and their optimization. In Duparre, A; Geyl, R. \textit{Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V}. 9628. vyd. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, s.~''96280F-1''-''96280F-14'', 14 s. ISBN~978-1-62841-817-0. Dostupné z: https://dx.doi.org/10.1117/12.2190109.

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