NEČAS, David, Ivan OHLÍDAL, Jiří VODÁK, Miloslav OHLÍDAL and Daniel FRANTA. Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry. In Duparre, A; Geyl, R. Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V. 9628th ed. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, p. "96280C-1"-"96280C-9", 9 pp. ISBN 978-1-62841-817-0. Available from: https://dx.doi.org/10.1117/12.2190091.
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Basic information
Original name Simultaneous determination of optical constants, local thickness, and local roughness of thin films by imaging spectroscopic reflectometry
Name in Czech Současné určení optických konstant, lokální tloušťky a lokální drsnosti tenkých vrstev pomocí zobrazovací spektroskopické refektometrie
Authors NEČAS, David (203 Czech Republic, guarantor, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution), Jiří VODÁK (203 Czech Republic, belonging to the institution), Miloslav OHLÍDAL (203 Czech Republic) and Daniel FRANTA (203 Czech Republic, belonging to the institution).
Edition 9628. vyd. BELLINGHAM, USA, Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, p. "96280C-1"-"96280C-9", 9 pp. 2015.
Publisher SPIE-INT SOC OPTICAL ENGINEERING
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10302 Condensed matter physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
Publication form printed version "print"
RIV identification code RIV/00216224:14310/15:00094362
Organization unit Faculty of Science
ISBN 978-1-62841-817-0
ISSN 0277-786X
Doi http://dx.doi.org/10.1117/12.2190091
UT WoS 000366832100005
Keywords in English thin films; roughness; scalar diffraction theory; Rayleigh-Rice theory; spectrophotometry; ellipsometry; imaging techniques; zinc selenide
Tags NZ, rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Michal Petr, učo 65024. Changed: 18/4/2018 14:38.
Abstract
A new optical characterization method based on imaging spectroscopic reflectometry (ISR) is presented and illustrated on the characterization of rough non-uniform epitaxial ZnSe films prepared on GaAs substrates. The method allows the determination of all parameters describing the thin films exhibiting boundary roughness and non-uniformity in thickness, i.e. determination of the spectral dependencies of the optical constants, map of local thickness and map of local rms values of heights of the irregularities for the rough boundaries. The local normal reflectance spectra in ISR correspond to small areas (37x37 pm2) on the thin films measured within the spectral range 270-900 nm by pixels of a CCD camera serving as the detector of imaging spectrophotometer constructed in our laboratory. To our experience the small areas corresponding to the pixels are sufficiently small so that the majority of the films can be considered uniform in all parameters within these areas. Boundary roughness is included into the reflectance formulas by means of the scalar diffraction theory (SDT) and the optical constant spectra of the ZnSe films were expressed by the dispersion model based on the parametrization of the joint density of electronic states (PJDOS). In general, there is a correlation between the searched parameters if the individual local reflectance spectra are fitted separately and, therefore, the local reflectance spectra measured for all the pixels are treated simultaneously using so called multi-pixel method in order to remove or reduce this correlation and determine the values of all the parameters with a sufficient accuracy. The results of the optical characterization of the same selected sample of the epitaxial ZnSe thin film obtained using the method presented here and combined method of variable-angle spectroscopic ellipsometry, spectroscopic reflectometry and single-pixel immersion spectroscopic reflectometry are introduced in the contribution as well.
Links
ED1.1.00/02.0068, research and development projectName: CEITEC - central european institute of technology
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
TA02010784, research and development projectName: Optimalizace vrstevnatých systémů používaných v optickém průmyslu
Investor: Technology Agency of the Czech Republic
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