Possibilities and limitations of imaging spectroscopic
reflectometry in optical characterization of thin films

D 2015

Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films

OHLÍDAL, Miloslav, Ivan OHLÍDAL, David NEČAS, Jiří VODÁK, Daniel FRANTA et. al.

Základní údaje

Originální název

Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films

Název česky

Možnosti a omezení zobrazovací spektroskopické reflektometrie v optické charakterizaci tenkých vrstev

Autoři

OHLÍDAL, Miloslav (203 Česká republika, garant), Ivan OHLÍDAL (203 Česká republika, domácí), David NEČAS (203 Česká republika, domácí), Jiří VODÁK (203 Česká republika), Daniel FRANTA (203 Česká republika, domácí), Pavel NÁDASKÝ (203 Česká republika) a František VIŽĎA (203 Česká republika)

Vydání

9628. vyd. BELLINGHAM, USA, Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, od s. "96280R-1"-"96280R-13", 13 s. 2015

Nakladatel

SPIE-INT SOC OPTICAL ENGINEERING

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

10302 Condensed matter physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Forma vydání

tištěná verze "print"

Kód RIV

RIV/00216224:14310/15:00094363

Organizační jednotka

Přírodovědecká fakulta

ISBN

978-1-62841-817-0

ISSN

DOI

http://dx.doi.org/10.1117/12.2191052

UT WoS

000366832100013

Klíčová slova anglicky

Imaging spectroscopic reflectometry; non-uniform thin films; optical parameters

Štítky

NZ, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 18. 4. 2018 14:29, Mgr. Michal Petr

Anotace

V originále

It is possible to encounter thin films exhibiting various defects in practice. One of these defects is area non-uniformity in optical parameters (e.g. in thickness). Therefore it is necessary to have methods for an optical characterization of non-uniform thin films. Imaging spectroscopic reflectometry provides methods enabling us to perform an efficient optical characterization of such films. It gives a possibility to determine spectral dependencies of a local reflectance at normal incidence of light belonging to small areas (37 mu m x 37 mu m in our case) on these non-uniform films. The local reflectance is measured by individual pixels of a CCD camera serving as a detector of an imaging spectroscopic reflectometer. It is mostly possible to express the local reflectance using formulas corresponding to a uniform thin film. It allows a relatively simple treatment of the experimental data obtained by imaging spectroscopic reflectometry. There are three methods for treating these experimental data in the special case of thickness non-uniformity, i.e. in the case of the same optical constants within a certain area of the film - single pixel imaging spectroscopic reflectometry method, combination of single-pixel imaging spectroscopic reflectometry method and conventional methods (conventional single spot spectroscopic ellipsometry and spectrophotometry), and multi-pixel imaging spectroscopic reflectometry method. These methods are discussed and examples of the optical characterization of thin films non-uniform in thickness corresponding to these methods are presented in this contribution.

Návaznosti

ED1.1.00/02.0068, projekt VaV

Název: CEITEC - central european institute of technology

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

TA02010784, projekt VaV

Název: Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Investor: Technologická agentura ČR, Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Citovat

OHLÍDAL, Miloslav, Ivan OHLÍDAL, David NEČAS, Jiří VODÁK, Daniel FRANTA, Pavel NÁDASKÝ a František VIŽĎA. Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films. In Duparre, A; Geyl, R. Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V. 9628. vyd. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, s. "96280R-1"-"96280R-13", 13 s. ISBN 978-1-62841-817-0. Dostupné z: https://dx.doi.org/10.1117/12.2191052.

@inproceedings{1384154,
   author = {Ohlídal, Miloslav and Ohlídal, Ivan and Nečas, David and Vodák, Jiří and Franta, Daniel and Nádaský, Pavel and Vižďa, František},
   address = {BELLINGHAM, USA},
   booktitle = {Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V},
   doi = {http://dx.doi.org/10.1117/12.2191052},
   edition = {9628},
   editor = {Duparre, A; Geyl, R},
   keywords = {Imaging spectroscopic reflectometry; non-uniform thin films; optical parameters},
   howpublished = {tištěná verze "print"},
   language = {eng},
   location = {BELLINGHAM, USA},
   isbn = {978-1-62841-817-0},
   pages = {"96280R-1"-"96280R-13"},
   publisher = {SPIE-INT SOC OPTICAL ENGINEERING},
   title = {Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films},
   year = {2015}
}

TY  - JOUR
ID  - 1384154
AU  - Ohlídal, Miloslav - Ohlídal, Ivan - Nečas, David - Vodák, Jiří - Franta, Daniel - Nádaský, Pavel - Vižďa, František
PY  - 2015
TI  - Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films
PB  - SPIE-INT SOC OPTICAL ENGINEERING
CY  - BELLINGHAM, USA
SN  - 9781628418170
KW  - Imaging spectroscopic reflectometry
KW  - non-uniform thin films
KW  - optical parameters
N2  - It is possible to encounter thin films exhibiting various defects in practice. One of these defects is area non-uniformity in optical parameters (e.g. in thickness). Therefore it is necessary to have methods for an optical characterization of non-uniform thin films. Imaging spectroscopic reflectometry provides methods enabling us to perform an efficient optical characterization of such films. It gives a possibility to determine spectral dependencies of a local reflectance at normal incidence of light belonging to small areas (37 mu m x 37 mu m in our case) on these non-uniform films. The local reflectance is measured by individual pixels of a CCD camera serving as a detector of an imaging spectroscopic reflectometer. It is mostly possible to express the local reflectance using formulas corresponding to a uniform thin film. It allows a relatively simple treatment of the experimental data obtained by imaging spectroscopic reflectometry. There are three methods for treating these experimental data in the special case of thickness non-uniformity, i.e. in the case of the same optical constants within a certain area of the film - single pixel imaging spectroscopic reflectometry method, combination of single-pixel imaging spectroscopic reflectometry method and conventional methods (conventional single spot spectroscopic ellipsometry and spectrophotometry), and multi-pixel imaging spectroscopic reflectometry method. These methods are discussed and examples of the optical characterization of thin films non-uniform in thickness corresponding to these methods are presented in this contribution.
ER  -

OHLÍDAL, Miloslav, Ivan OHLÍDAL, David NEČAS, Jiří VODÁK, Daniel FRANTA, Pavel NÁDASKÝ a František VIŽĎA. Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films. In Duparre, A; Geyl, R. \textit{Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V}. 9628. vyd. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, s.~''96280R-1''-''96280R-13'', 13 s. ISBN~978-1-62841-817-0. Dostupné z: https://dx.doi.org/10.1117/12.2191052.

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