Temporal evolution of Ti sputtered species number densities in multi-pulse HiPIMS process

FEKETE, Matej, Jaroslav HNILICA, Pavel SOUČEK, Lukáš ZÁBRANSKÝ and Petr VAŠINA. Temporal evolution of Ti sputtered species number densities in multi-pulse HiPIMS process. In SVC TechCon 2017. 2017. ISSN 0737-5921.

Basic information

• Original name: Temporal evolution of Ti sputtered species number densities in multi-pulse HiPIMS process
• Authors: FEKETE, Matej (703 Slovakia, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Pavel SOUČEK (203 Czech Republic, belonging to the institution), Lukáš ZÁBRANSKÝ (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution).
• Edition: SVC TechCon 2017, 2017.

Other information

• Original language: English
• Type of outcome: Conference abstract
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: United States of America
• Confidentiality degree: is not subject to a state or trade secret
• RIV identification code: RIV/00216224:14310/17:00094831
• Organization unit: Faculty of Science
• ISSN: 0737-5921
• Keywords in English: m-HiPIMS; EBF; titanium
• Tags: International impact

Abstract

The aim of this paper is to study the temporal evolutions of sputtered species number densities during a preceding (P) and a subsequent (S) pulse in a multi-pulse HiPIMS. The Ti atom number density does not reach the maximum at the time of the maximal discharge current. It is shown that the residual particles from the P pulse are presented at the beginning of the S pulse even for the longest studied delay between the P and the S pulse. The ionization fractions of sputtered species attained at the end of the S pulses are always lower compared to the P pulse. The coatings produced by multi-pulse HiPIMS exhibited decreased roughness and increased hardness in comparison with standard HiPIMS and DC magnetron sputtered coating.

Links

• ED2.1.00/03.0086, research and development project: Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
• GA15-00863S, research and development project: Name: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace

Investor: Czech Science Foundation

• LO1411, research and development project: Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)

Investor: Ministry of Education, Youth and Sports of the CR