ISA, Fabio, Arik JUNG, Marco SALVALAGLIO, Yadira Arroyo Rojas DASILVA, Ivan MAROZAU, Mojmír MEDUŇA, Michael BARGET, Anna MARZEGALLI, Giovanni ISELLA, Rolf ERNI, Fabio PEZZOLI, Emiliano BONERA, Philippe NIEDERMANN, Olha SEREDA, Pierangelo GRONING, Francesco MONTALENTI a Hans VON KAENEL. Strain Engineering in Highly Mismatched SiGe/Si Heterostructures. Materials Science in Semiconductor Processing. Oxford: Elsevier Science, 2017, roč. 70, November, s. 117-122. ISSN 1369-8001. Dostupné z: https://dx.doi.org/10.1016/j.mssp.2016.08.019. |
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@article{1387401, author = {Isa, Fabio and Jung, Arik and Salvalaglio, Marco and Dasilva, Yadira Arroyo Rojas and Marozau, Ivan and Meduňa, Mojmír and Barget, Michael and Marzegalli, Anna and Isella, Giovanni and Erni, Rolf and Pezzoli, Fabio and Bonera, Emiliano and Niedermann, Philippe and Sereda, Olha and Groning, Pierangelo and Montalenti, Francesco and von Kaenel, Hans}, article_location = {Oxford}, article_number = {November}, doi = {http://dx.doi.org/10.1016/j.mssp.2016.08.019}, keywords = {Strain engineering; Dislocations; Elastic relaxation; Patterned substrates; SiGe}, language = {eng}, issn = {1369-8001}, journal = {Materials Science in Semiconductor Processing}, title = {Strain Engineering in Highly Mismatched SiGe/Si Heterostructures}, url = {http://www.sciencedirect.com/science/article/pii/S1369800116303201?via%3Dihub}, volume = {70}, year = {2017} }
TY - JOUR ID - 1387401 AU - Isa, Fabio - Jung, Arik - Salvalaglio, Marco - Dasilva, Yadira Arroyo Rojas - Marozau, Ivan - Meduňa, Mojmír - Barget, Michael - Marzegalli, Anna - Isella, Giovanni - Erni, Rolf - Pezzoli, Fabio - Bonera, Emiliano - Niedermann, Philippe - Sereda, Olha - Groning, Pierangelo - Montalenti, Francesco - von Kaenel, Hans PY - 2017 TI - Strain Engineering in Highly Mismatched SiGe/Si Heterostructures JF - Materials Science in Semiconductor Processing VL - 70 IS - November SP - 117-122 EP - 117-122 PB - Elsevier Science SN - 13698001 KW - Strain engineering KW - Dislocations KW - Elastic relaxation KW - Patterned substrates KW - SiGe UR - http://www.sciencedirect.com/science/article/pii/S1369800116303201?via%3Dihub L2 - http://www.sciencedirect.com/science/article/pii/S1369800116303201?via%3Dihub N2 - In this work we present an innovative approach to realise coherent, highly-mismatched 3-dimensional heterostructures on substrates patterned at the micrometre-scale. ER -
ISA, Fabio, Arik JUNG, Marco SALVALAGLIO, Yadira Arroyo Rojas DASILVA, Ivan MAROZAU, Mojmír MEDUŇA, Michael BARGET, Anna MARZEGALLI, Giovanni ISELLA, Rolf ERNI, Fabio PEZZOLI, Emiliano BONERA, Philippe NIEDERMANN, Olha SEREDA, Pierangelo GRONING, Francesco MONTALENTI a Hans VON KAENEL. Strain Engineering in Highly Mismatched SiGe/Si Heterostructures. \textit{Materials Science in Semiconductor Processing}. Oxford: Elsevier Science, 2017, roč.~70, November, s.~117-122. ISSN~1369-8001. Dostupné z: https://dx.doi.org/10.1016/j.mssp.2016.08.019.
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