Ti atom and Ti ion number density evolution in standard and
multi-pulse HiPIMS

J 2017

Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS

FEKETE, Matej, Jaroslav HNILICA, Catalin VITELARU, Tiberiu MINEA, Petr VAŠINA et. al.

Základní údaje

Originální název

Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS

Autoři

FEKETE, Matej (703 Slovensko, domácí), Jaroslav HNILICA (203 Česká republika, domácí), Catalin VITELARU (642 Rumunsko), Tiberiu MINEA (250 Francie) a Petr VAŠINA (203 Česká republika, garant, domácí)

Vydání

Journal of Physics D: Applied Physics, Bristol, IOP PUBLISHING LTD, 2017, 0022-3727

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 2.373

Kód RIV

RIV/00216224:14310/17:00094893

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1088/1361-6463/aa7e6d

UT WoS

000415299900001

Klíčová slova anglicky

magnetron sputtering; HiPIMS; plasma diagnostics; EBF; TD-LAS; m-HiPIMS

Štítky

NZ, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 12. 4. 2018 15:40, Ing. Nicole Zrilić

Anotace

V originále

In this paper, comparison of standard and multi-pulse high power impulse magnetron sputtering is performed. The effective branching fraction method is used for titanium atom and ion number density determination, showing that the residual titanium atoms and ions from the preceding pulse are crucial for the subsequent pulse initiation and development. It is shown that the discharge current rises faster in the subsequent pulse, but does not reach the same maximum as in the preceding pulse. The time evolution of the titanium atom density shows different behaviour, initial increase is followed by decrease in the preceding pulse and a rather constant evolution during the subsequent pulse. As for the titanium ion number density, it reaches typically lower values in the subsequent pulse, approaching the maximum values from the preceding pulse only at long delays of 1.5 ms. The most significant increase of the total ion flux to the substrate, namely 43% increase with respect to standard high power impulse magnetron sputtering, is observed in the multi-pulse high power impulse magnetron sputtering with the shortest studied delay of 200 us. The residual titanium atoms produced by the preceding pulse are already thermalized at the beginning of the subsequent pulse, thus being available for ionization during the subsequent pulse. The reservoir of these thermalized atoms gets depleted as the delay increases. However, even for the longest studied delay of 1.5 ms the influence of the preceding pulse on the subsequent pulse is still distinct, including the enhancement of the total ion flux to the substrate by 23%.

Návaznosti

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

GAP205/12/0407, projekt VaV

Název: Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev

Investor: Grantová agentura ČR, Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev

GA15-00863S, projekt VaV

Název: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace

Investor: Grantová agentura ČR, Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

FEKETE, Matej, Jaroslav HNILICA, Catalin VITELARU, Tiberiu MINEA a Petr VAŠINA. Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS. Journal of Physics D: Applied Physics. Bristol: IOP PUBLISHING LTD, 2017, roč. 50, č. 36, s. nestránkováno, 12 s. ISSN 0022-3727. Dostupné z: https://dx.doi.org/10.1088/1361-6463/aa7e6d.

@article{1387787,
   author = {Fekete, Matej and Hnilica, Jaroslav and Vitelaru, Catalin and Minea, Tiberiu and Vašina, Petr},
   article_location = {Bristol},
   article_number = {36},
   doi = {http://dx.doi.org/10.1088/1361-6463/aa7e6d},
   keywords = {magnetron sputtering; HiPIMS; plasma diagnostics; EBF; TD-LAS; m-HiPIMS},
   language = {eng},
   issn = {0022-3727},
   journal = {Journal of Physics D: Applied Physics},
   title = {Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS},
   url = {http://iopscience.iop.org/article/10.1088/1361-6463/aa7e6d/meta},
   volume = {50},
   year = {2017}
}

TY  - JOUR
ID  - 1387787
AU  - Fekete, Matej - Hnilica, Jaroslav - Vitelaru, Catalin - Minea, Tiberiu - Vašina, Petr
PY  - 2017
TI  - Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS
JF  - Journal of Physics D: Applied Physics
VL  - 50
IS  - 36
SP  - nestránkováno
EP  - nestránkováno
PB  - IOP PUBLISHING LTD
SN  - 00223727
KW  - magnetron sputtering
KW  - HiPIMS
KW  - plasma diagnostics
KW  - EBF
KW  - TD-LAS
KW  - m-HiPIMS
UR  - http://iopscience.iop.org/article/10.1088/1361-6463/aa7e6d/meta
L2  - http://iopscience.iop.org/article/10.1088/1361-6463/aa7e6d/meta
N2  - In this paper, comparison of standard and multi-pulse high power impulse magnetron sputtering is performed. The effective branching fraction method is used for titanium atom and ion number density determination, showing that the residual titanium atoms and ions from the preceding pulse are crucial for the subsequent pulse initiation and development. It is shown that the discharge current rises faster in the subsequent pulse, but does not reach the same maximum as in the preceding pulse. The time evolution of the titanium atom density shows different behaviour, initial increase is followed by decrease in the preceding pulse and a rather constant evolution during the subsequent pulse. As for the titanium ion number density, it reaches typically lower values in the subsequent pulse, approaching the maximum values from the preceding pulse only at long delays of 1.5 ms. The most significant increase of the total ion flux to the substrate, namely 43% increase with respect to standard high power impulse magnetron sputtering, is observed in the multi-pulse high power impulse magnetron sputtering with the shortest studied delay of 200 us. The residual titanium atoms produced by the preceding pulse are already thermalized at the beginning of the subsequent pulse, thus being available for ionization during the subsequent pulse. The reservoir of these thermalized atoms gets depleted as the delay increases. However, even for the longest studied delay of 1.5 ms the influence of the preceding pulse on the subsequent pulse is still distinct, including the enhancement of the total ion flux to the substrate by 23%.
ER  -

FEKETE, Matej, Jaroslav HNILICA, Catalin VITELARU, Tiberiu MINEA a Petr VAŠINA. Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS. \textit{Journal of Physics D: Applied Physics}. Bristol: IOP PUBLISHING LTD, 2017, roč.~50, č.~36, s.~nestránkováno, 12 s. ISSN~0022-3727. Dostupné z: https://dx.doi.org/10.1088/1361-6463/aa7e6d.

Podrobný výpis o publikaci