Detailed Information on Publication Record
2017
Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure
ZAJÍČKOVÁ, Lenka, Petr JELÍNEK, Adam OBRUSNÍK, Jiří VODÁK, David NEČAS et. al.Basic information
Original name
Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure
Authors
ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor, belonging to the institution), Petr JELÍNEK (203 Czech Republic, belonging to the institution), Adam OBRUSNÍK (203 Czech Republic, belonging to the institution), Jiří VODÁK (203 Czech Republic, belonging to the institution) and David NEČAS (203 Czech Republic, belonging to the institution)
Edition
Plasma Physics and Controlled Fusion, BRISTOL, Institute of Physics, 2017, 0741-3335
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
United Kingdom of Great Britain and Northern Ireland
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 3.032
RIV identification code
RIV/00216224:14740/17:00097536
Organization unit
Central European Institute of Technology
UT WoS
000395441600001
Keywords in English
PECVD; plasma polymerization; carboxyl films; gas dynamics simulations; atomic force microscopy
Tags
International impact, Reviewed
Změněno: 21/3/2018 10:53, Mgr. David Nečas, Ph.D.
Abstract
V originále
In this contribution, we focus on the general problems of plasma-enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at atmospheric pressure is advection-driven, special attention is paid to the gas dynamics simulations, gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two of its characteristics: (i) suppression of filaments in dielectric barrier discharges, and (ii) improved film cross-linking, keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated into the deposited films, leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with respect to gas flow and the deposition time on the topography of the deposited films.
Links
| LM2015041, research and development project |
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| LQ1601, research and development project |
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