Plasma-enhanced CVD of functional coatings in Ar/maleic
anhydride/C2H2 homogeneous dielectric barrier discharges at
atmospheric pressure

J 2017

Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure

ZAJÍČKOVÁ, Lenka, Petr JELÍNEK, Adam OBRUSNÍK, Jiří VODÁK, David NEČAS et. al.

Základní údaje

Originální název

Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure

Autoři

ZAJÍČKOVÁ, Lenka (203 Česká republika, garant, domácí), Petr JELÍNEK (203 Česká republika, domácí), Adam OBRUSNÍK (203 Česká republika, domácí), Jiří VODÁK (203 Česká republika, domácí) a David NEČAS (203 Česká republika, domácí)

Vydání

Plasma Physics and Controlled Fusion, BRISTOL, Institute of Physics, 2017, 0741-3335

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 3.032

Kód RIV

RIV/00216224:14740/17:00097536

Organizační jednotka

Středoevropský technologický institut

DOI

http://dx.doi.org/10.1088/1361-6587/aa52e7

UT WoS

000395441600001

Klíčová slova anglicky

PECVD; plasma polymerization; carboxyl films; gas dynamics simulations; atomic force microscopy

Štítky

CF NANO, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 21. 3. 2018 10:53, Mgr. David Nečas, Ph.D.

Anotace

V originále

In this contribution, we focus on the general problems of plasma-enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at atmospheric pressure is advection-driven, special attention is paid to the gas dynamics simulations, gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two of its characteristics: (i) suppression of filaments in dielectric barrier discharges, and (ii) improved film cross-linking, keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated into the deposited films, leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with respect to gas flow and the deposition time on the topography of the deposited films.

Návaznosti

LM2015041, projekt VaV

Název: CEITEC Nano

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, CEITEC Nano

LQ1601, projekt VaV

Název: CEITEC 2020 (Akronym: CEITEC2020)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, CEITEC 2020

Citovat

ZAJÍČKOVÁ, Lenka, Petr JELÍNEK, Adam OBRUSNÍK, Jiří VODÁK a David NEČAS. Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure. Plasma Physics and Controlled Fusion. BRISTOL: Institute of Physics, 2017, roč. 59, č. 3, s. 034003-34015. ISSN 0741-3335. Dostupné z: https://dx.doi.org/10.1088/1361-6587/aa52e7.

@article{1389280,
   author = {Zajíčková, Lenka and Jelínek, Petr and Obrusník, Adam and Vodák, Jiří and Nečas, David},
   article_location = {BRISTOL},
   article_number = {3},
   doi = {http://dx.doi.org/10.1088/1361-6587/aa52e7},
   keywords = {PECVD; plasma polymerization; carboxyl films; gas dynamics simulations; atomic force microscopy},
   language = {eng},
   issn = {0741-3335},
   journal = {Plasma Physics and Controlled Fusion},
   title = {Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure},
   url = {http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta},
   volume = {59},
   year = {2017}
}

TY  - JOUR
ID  - 1389280
AU  - Zajíčková, Lenka - Jelínek, Petr - Obrusník, Adam - Vodák, Jiří - Nečas, David
PY  - 2017
TI  - Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure
JF  - Plasma Physics and Controlled Fusion
VL  - 59
IS  - 3
SP  - 034003
EP  - 034003
PB  - Institute of Physics
SN  - 07413335
KW  - PECVD
KW  - plasma polymerization
KW  - carboxyl films
KW  - gas dynamics simulations
KW  - atomic force microscopy
UR  - http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta
L2  - http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta
N2  - In this contribution, we focus on the general problems of plasma-enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at atmospheric pressure is advection-driven, special attention is paid to the gas dynamics simulations, gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two of its characteristics: (i) suppression of filaments in dielectric barrier discharges, and (ii) improved film cross-linking, keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated into the deposited films, leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with respect to gas flow and the deposition time on the topography of the deposited films.
ER  -

ZAJÍČKOVÁ, Lenka, Petr JELÍNEK, Adam OBRUSNÍK, Jiří VODÁK a David NEČAS. Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure. \textit{Plasma Physics and Controlled Fusion}. BRISTOL: Institute of Physics, 2017, roč.~59, č.~3, s.~034003-34015. ISSN~0741-3335. Dostupné z: https://dx.doi.org/10.1088/1361-6587/aa52e7.

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