Optical characterization of hafnia films deposited by ALD on
copper cold-rolled sheets by difference ellipsometry

J 2017

Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry

FRANTA, Daniel, Minna Paula Katriina KOTILAINEN, Richard KRUMPOLEC a Ivan OHLÍDAL

Základní údaje

Originální název

Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry

Autoři

FRANTA, Daniel (203 Česká republika, domácí), Minna Paula Katriina KOTILAINEN (246 Finsko, domácí), Richard KRUMPOLEC (703 Slovensko, domácí) a Ivan OHLÍDAL (203 Česká republika, domácí)

Vydání

Applied Surface Science, AMSTERDAM, ELSEVIER SCIENCE BV, 2017, 0169-4332

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Nizozemské království

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 4.439

Kód RIV

RIV/00216224:14310/17:00097950

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1016/j.apsusc.2016.12.164

UT WoS

000408756700024

Klíčová slova anglicky

Hafnia; Ellipsometry; Atomic layer deposition; Solar absorber

Štítky

NZ, rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 10. 4. 2018 11:43, Ing. Nicole Zrilić

Anotace

V originále

Hafnium oxide (HfO2) thin films could be potentially used as thermal diffusion barrier coatings for copper absorbers used in solar thermal collectors. Atomic layer deposition (ALD) was used to deposit thin, dense, non-columnar HfO2 films on copper sheets, which are established base materials for solar absorbers. The aim of this work is to find a simple and efficient method for quantitative characterization of thin hafnium oxide films deposited on imperfect rough copper sheets. The difference ellipsometry applied in infrared region was found to be a practical tool for non-destructive characterization of thin films deposited onto metal surfaces even when these surfaces are imperfect. The presented method enables us not only to identify the presence of hafnium oxide but also to perform quantitative characterization, i.e. to determine the thickness of the film. Moreover, a simple method, in which the thickness is determined from the height of the structure in the difference ellipsometric data, is presented. This method is demonstrated on HfO2 film with nominal thickness 60 nm deposited by ALD on copper cold-rolled sheet.

Návaznosti

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

Citovat

FRANTA, Daniel, Minna Paula Katriina KOTILAINEN, Richard KRUMPOLEC a Ivan OHLÍDAL. Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry. Applied Surface Science. AMSTERDAM: ELSEVIER SCIENCE BV, 2017, roč. 421, November, s. 420-423. ISSN 0169-4332. Dostupné z: https://dx.doi.org/10.1016/j.apsusc.2016.12.164.

@article{1392856,
   author = {Franta, Daniel and Kotilainen, Minna Paula Katriina and Krumpolec, Richard and Ohlídal, Ivan},
   article_location = {AMSTERDAM},
   article_number = {November},
   doi = {http://dx.doi.org/10.1016/j.apsusc.2016.12.164},
   keywords = {Hafnia; Ellipsometry; Atomic layer deposition; Solar absorber},
   language = {eng},
   issn = {0169-4332},
   journal = {Applied Surface Science},
   title = {Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry},
   url = {http://www.sciencedirect.com/science/article/pii/S0169433216328951},
   volume = {421},
   year = {2017}
}

TY  - JOUR
ID  - 1392856
AU  - Franta, Daniel - Kotilainen, Minna Paula Katriina - Krumpolec, Richard - Ohlídal, Ivan
PY  - 2017
TI  - Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry
JF  - Applied Surface Science
VL  - 421
IS  - November
SP  - 420-423
EP  - 420-423
PB  - ELSEVIER SCIENCE BV
SN  - 01694332
KW  - Hafnia
KW  - Ellipsometry
KW  - Atomic layer deposition
KW  - Solar absorber
UR  - http://www.sciencedirect.com/science/article/pii/S0169433216328951
N2  - Hafnium oxide (HfO2) thin films could be potentially used as thermal diffusion barrier coatings for copper absorbers used in solar thermal collectors. Atomic layer deposition (ALD) was used to deposit thin, dense, non-columnar HfO2 films on copper sheets, which are established base materials for solar absorbers. The aim of this work is to find a simple and efficient method for quantitative characterization of thin hafnium oxide films deposited on imperfect rough copper sheets. The difference ellipsometry applied in infrared region was found to be a practical tool for non-destructive characterization of thin films deposited onto metal surfaces even when these surfaces are imperfect. The presented method enables us not only to identify the presence of hafnium oxide but also to perform quantitative characterization, i.e. to determine the thickness of the film. Moreover, a simple method, in which the thickness is determined from the height of the structure in the difference ellipsometric data, is presented. This method is demonstrated on HfO2 film with nominal thickness 60 nm deposited by ALD on copper cold-rolled sheet.
ER  -

FRANTA, Daniel, Minna Paula Katriina KOTILAINEN, Richard KRUMPOLEC a Ivan OHLÍDAL. Optical characterization of hafnia films deposited by ALD on copper cold-rolled sheets by difference ellipsometry. \textit{Applied Surface Science}. AMSTERDAM: ELSEVIER SCIENCE BV, 2017, roč.~421, November, s.~420-423. ISSN~0169-4332. Dostupné z: https://dx.doi.org/10.1016/j.apsusc.2016.12.164.

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