2017
Optical properties of TixSi1-xO2 solid solutions
ONDRAČKA, Pavel, David HOLEC, David NEČAS, Eva DVOŘÁKOVÁ, Stéphane ELISABETH et. al.Základní údaje
Originální název
Optical properties of TixSi1-xO2 solid solutions
Autoři
ONDRAČKA, Pavel (203 Česká republika, domácí), David HOLEC (203 Česká republika), David NEČAS (203 Česká republika, domácí), Eva DVOŘÁKOVÁ (203 Česká republika, domácí), Stéphane ELISABETH (250 Francie), Antoinne GOULLET (250 Francie) a Lenka ZAJÍČKOVÁ (203 Česká republika, garant, domácí)
Vydání
Physical Review B, College PK, American Physical Society, 2017, 2469-9950
Další údaje
Jazyk
angličtina
Typ výsledku
Článek v odborném periodiku
Obor
10306 Optics
Stát vydavatele
Spojené státy
Utajení
není předmětem státního či obchodního tajemství
Odkazy
Impakt faktor
Impact factor: 3.813
Kód RIV
RIV/00216224:14740/17:00099678
Organizační jednotka
Středoevropský technologický institut
UT WoS
000402463400005
Klíčová slova anglicky
TixSi1-xO2; optical properties; DFT; band gap
Štítky
Příznaky
Mezinárodní význam, Recenzováno
Změněno: 21. 3. 2018 10:41, Mgr. David Nečas, Ph.D.
Anotace
V originále
In this work, we use density functional theory to predict the optical properties of TixSi1-xO2 solid solutions. The special quasirandom structure method and the simulated annealing procedure were applied to produce models of crystalline and amorphous TixSi1-xO2. These were fully structurally optimized by using the VASP package, while their electronic structure and optical properties were subsequently calculated by using the WIEN2k package employing the TB-mBJ potential. The calculated band gaps for a-TixSi1-xO2 evaluated by using the Tauc-like fitting approach are 8.53 eV for SiO2, quickly decreasing to 4.0 eV at x = 0.19, 3.52 eV at x = 0.34, and 3.24 eV for TiO2. Experimental samples were prepared by means of plasma-enhanced chemical vapor deposition to support the calculations. Ellipsometry and spectrophotometry yield a compositional trend for the experimental optical band gap comparable with our predictions: a quick decrease from 7.94 eV for pure SiO2 to 3.91 eV at x = 0.15, followed by a much slower decrease over the rest of the composition range ending at 3.26 eV for pure TiO2. A detailed analysis of anatase and rutile-based solid solutions reveals the introduction of silicon-induced oxygen states into the band gap in the TiO2-rich composition region, which results in the predicted reduction of the band gap. However, we show that the optical absorption of those states is negligible. We have obtained good agreement between the calculated and measured imaginary part of the dielectric function epsilon(i), especially for the TiO2-rich compositions. Finally, we predict an almost-linear refractive index change at 632.8 nm between a-SiO2 (1.36) and a-TiO2 (2.34), which was experimentally confirmed.
Návaznosti
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7AMB15AT017, projekt VaV |
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7AMB15FR036, projekt VaV |
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