SOUČEK, Pavel, Jaroslav HNILICA, Lukáš ZÁBRANSKÝ, Vilma BURŠÍKOVÁ, Monika STUPAVSKÁ and Petr VAŠINA. The role of applied bias on the properties of HiPIMS deposited nc-TiC/a-C:H coatings. In 16th International Conference on Plasma Surface Engineering. 2018.
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Basic information
Original name The role of applied bias on the properties of HiPIMS deposited nc-TiC/a-C:H coatings
Authors SOUČEK, Pavel (203 Czech Republic, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Lukáš ZÁBRANSKÝ (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution), Monika STUPAVSKÁ (703 Slovakia, belonging to the institution) and Petr VAŠINA (203 Czech Republic, guarantor, belonging to the institution).
Edition 16th International Conference on Plasma Surface Engineering, 2018.
Other information
Original language English
Type of outcome Conference abstract
Field of Study 10305 Fluids and plasma physics
Country of publisher Germany
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/18:00103777
Organization unit Faculty of Science
Keywords in English nanocomposites; HiPIMS; magnetron sputtering
Tags International impact
Changed by Changed by: doc. Mgr. Pavel Souček, Ph.D., učo 175085. Changed: 24/9/2018 08:14.
Abstract
Nanocomposite coatings consisting of nanocrystallites embedded in an amorphous matrix such as nc-TiC/a-C:H can be tailored to exhibit an unusual combination of properties like high hardness and elastic modulus combined with low friction and wear. These coatings are usually deposited utilising direct current magnetron sputtering (DCMS) leading to low ionisation of the sputtered titanium and to lower Ar+ ion bombardment impinging the growing coating. The ion bombardment of the substrates is routinely enhanced via increasing the energy of the bombarding ions due to the application of a negative bias onto the samples. The use of high power impulse magnetron sputtering (HiPIMS) usually leads to much higher ionisation of the sputtered titanium which can alter the deposition process and to more severe ion bombardment of the growing coating changing the properties of the deposited coatings.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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