Space-resolved evolution of sputtered species number densities
in HiPIMS and DCMS discharge

a 2018

Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge

BERNÁTOVÁ, Katarína, Matej FEKETE, Peter KLEIN, Jaroslav HNILICA, Petr VAŠINA et. al.

Základní údaje

Originální název

Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge

Název anglicky

Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge

Autoři

BERNÁTOVÁ, Katarína, Matej FEKETE, Peter KLEIN, Jaroslav HNILICA a Petr VAŠINA

Vydání

16th International Conference on Plasma Surface Engineering, 2018

Další údaje

Typ výsledku

Konferenční abstrakt

Utajení

není předmětem státního či obchodního tajemství

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

HiPIMS; Ionization fraction of sputtered species; Deposition flux

Příznaky

Mezinárodní význam

Změněno: 24. 9. 2018 09:43, Mgr. Katarína Bernátová, Ph.D.

Anotace

V originále

Magnetron sputtering is a physical vapor deposition technique used in the whole spectrum of industrial applications; thus, it is crucial to characterize the process behavior thoroughly. The analysis of non-reactive Direct Current Magnetron Sputtering (DCMS) and High Power Impulse Magnetron Sputtering (HiPIMS) in the presented study is performed using a Quartz Crystal Monitor (QCM) and Optical Emission Spectroscopy (OES). The QCM system can be equipped with biasable grids or a gridless sensor with magnetic electron filter, and it is used to measure separately the flux of atoms and of the ionized particles impinging the substrate. A spectroscopic method utilizing self-absorption of the plasma and Effective Branching Fractions (EBF) is employed to evaluate the absolute ground state titanium atom and ion number densities. A systematical study on three discharge parameters – working pressure, duty cycle and distance from the titanium target - is presented. The study is realized at three different distances from the target – in the magnetized plasma region, between the target and the substrate and at the substrate level. The investigation is performed at a constant mean power and pulse duration. Both the titanium atom and titanium ion number densities are correlated with the overall atom and ion deposition fluxes at the substrate level, respectively.

Návaznosti

LO1411, projekt VaV

Název: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Akronym: CEPLANT plus)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

TJ01000157, projekt VaV

Název: Optimalizace procesu depozice průmyslových ochranných povlaků

Investor: Technologická agentura ČR, Optimalizace procesu depozice průmyslových ochranných povlaků

Citovat

BERNÁTOVÁ, Katarína, Matej FEKETE, Peter KLEIN, Jaroslav HNILICA a Petr VAŠINA. Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge. In 16th International Conference on Plasma Surface Engineering. 2018.

@proceedings{1440796,
   author = {Bernátová, Katarína and Fekete, Matej and Klein, Peter and Hnilica, Jaroslav and Vašina, Petr},
   booktitle = {16th International Conference on Plasma Surface Engineering},
   keywords = {HiPIMS; Ionization fraction of sputtered species; Deposition flux},
   title = {Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge},
   year = {2018}
}

TY  - CONF
ID  - 1440796
AU  - Bernátová, Katarína - Fekete, Matej - Klein, Peter - Hnilica, Jaroslav - Vašina, Petr
PY  - 2018
TI  - Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge
KW  - HiPIMS
KW  - Ionization fraction of sputtered species
KW  - Deposition flux
N2  - Magnetron sputtering is a physical vapor deposition technique used in the whole spectrum of industrial applications; thus, it is crucial to characterize the process behavior thoroughly. The analysis of non-reactive Direct Current Magnetron Sputtering (DCMS) and High Power Impulse Magnetron Sputtering (HiPIMS) in the presented study is performed using a Quartz Crystal Monitor (QCM) and Optical Emission Spectroscopy (OES). The QCM system can be equipped with biasable grids or a gridless sensor with magnetic electron filter, and it is used to measure separately the flux of atoms and of the ionized particles impinging the substrate. A spectroscopic method utilizing self-absorption of the plasma and Effective Branching Fractions (EBF) is employed to evaluate the absolute ground state titanium atom and ion number densities. A systematical study on three discharge parameters – working pressure, duty cycle and distance from the titanium target - is presented. The study is realized at three different distances from the target – in the magnetized plasma region, between the target and the substrate and at the substrate level. The investigation is performed at a constant mean power and pulse duration. Both the titanium atom and titanium ion number densities are correlated with the overall atom and ion deposition fluxes at the substrate level, respectively.
ER  -

BERNÁTOVÁ, Katarína, Matej FEKETE, Peter KLEIN, Jaroslav HNILICA a Petr VAŠINA. Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge. In \textit{16th International Conference on Plasma Surface Engineering}. 2018.

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