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@article{1502021,
author = {Fekete, Matej and Bernátová, Katarína and Klein, Peter and Hnilica, Jaroslav and Vašina, Petr},
article_location = {Bristol},
article_number = {2},
doi = {http://dx.doi.org/10.1088/1361-6595/ab0363},
keywords = {magnetron sputtering; reactive HiPIMS; ionization fraction; titanium; oxygen; nitrogen; acetylene},
language = {eng},
issn = {0963-0252},
journal = {Plasma Sources Science and Technology},
title = {Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene},
url = {https://iopscience.iop.org/article/10.1088/1361-6595/ab0363/pdf},
volume = {28},
year = {2019}
}
TY - JOUR
ID - 1502021
AU - Fekete, Matej - Bernátová, Katarína - Klein, Peter - Hnilica, Jaroslav - Vašina, Petr
PY - 2019
TI - Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene
JF - Plasma Sources Science and Technology
VL - 28
IS - 2
SP - 1-11
EP - 1-11
PB - IOP Publishing Ltd.
SN - 09630252
KW - magnetron sputtering
KW - reactive HiPIMS
KW - ionization fraction
KW - titanium
KW - oxygen
KW - nitrogen
KW - acetylene
UR - https://iopscience.iop.org/article/10.1088/1361-6595/ab0363/pdf
L2 - https://iopscience.iop.org/article/10.1088/1361-6595/ab0363/pdf
N2 - Reactive high power impulse magnetron sputtering offers a great opportunity for high quality coating production, thus understanding the processes accompanying deposition is of great importance. In this paper, the evolution of numerous discharge parameters such as total pressure, discharge current and sputtered species number densities are studied in argon with oxygen, nitrogen or acetylene admixture. The experiments are compared to the reactive direct current magnetron sputtering where the deposition process usually exhibits hysteresis behaviour and the ionization fraction of sputtered species is significantly lower. The decrease in the titanium atom and ion number densities with the increasing degree of target poisoning is detected for all the studied admixtures. However, while the sputtered species number densities decrease the sputtered species ionization fraction increases. Depending on the reactive gas admixture, the ionization fraction of the sputtered species increases from 75% achieved in pure argon discharge up to 90% attained in the poisoned mode of the reactive sputtering. This increase was the most pronounced for oxygen and nitrogen admixtures. Mutual comparison of the reactive sputtering with nitrogen, oxygen and acetylene indicated multiple causes for the observed increase.
ER -
FEKETE, Matej, Katarína BERNÁTOVÁ, Peter KLEIN, Jaroslav HNILICA a Petr VAŠINA. Evolution of discharge parameters and sputtered species ionization in reactive HiPIMS with oxygen, nitrogen and acetylene. \textit{Plasma Sources Science and Technology}. Bristol: IOP Publishing Ltd., 2019, roč.~28, č.~2, s.~1-11. ISSN~0963-0252. Dostupné z: https://dx.doi.org/10.1088/1361-6595/ab0363.
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