FRANTA, Daniel, Jiří VOHÁNKA, Martin BRÁNECKÝ, Pavel FRANTA, Martin ČERMÁK, Ivan OHLÍDAL and Vladimír ČECH. Optical properties of the crystalline silicon wafers described using the universal dispersion model. Journal of Vacuum Science & Technology B. New York: A V S AMER INST PHYSICS, 2019, vol. 37, No 6, p. "062907-1"-"062907-14", 14 pp. ISSN 2166-2746. Available from: https://dx.doi.org/10.1116/1.5122284.
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Basic information
Original name Optical properties of the crystalline silicon wafers described using the universal dispersion model
Authors FRANTA, Daniel (203 Czech Republic, belonging to the institution), Jiří VOHÁNKA (203 Czech Republic, belonging to the institution), Martin BRÁNECKÝ (203 Czech Republic), Pavel FRANTA (203 Czech Republic, belonging to the institution), Martin ČERMÁK (203 Czech Republic, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution) and Vladimír ČECH (203 Czech Republic).
Edition Journal of Vacuum Science & Technology B, New York, A V S AMER INST PHYSICS, 2019, 2166-2746.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10306 Optics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.511
RIV identification code RIV/00216224:14310/19:00112018
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1116/1.5122284
UT WoS 000522021700058
Keywords in English Spectrophotometry;Gaussian broadening;Optical constants;Optical properties;Phonons;Dielectric properties
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Marie Šípková, DiS., učo 437722. Changed: 17/4/2020 17:21.
Abstract
The optical properties of a slightly boron doped float-zone crystalline silicon wafer are studied using ellipsometry and spectrophotometry in a wide spectral range from far IR to vacuum UV. One side of the wafer was cleaned in an argon plasma, which influenced the optical properties of silicon near the surface. The dielectric response of silicon was modeled using a simplified universal dispersion model which is constructed on the basis of parameterization of the joint density of states describing both the electronic and phonon excitations. Several variants of models describing phonon absorption and interband transitions are discussed. It was possible to accurately determine the optical constants of bulk silicon and the optical constants near the perturbed surface over a wide spectral range. These optical constants agree well with those found in other works. From the optical measurements, it was also possible to determine the thickness of the wafer and the static value of resistivity, and the determined values agreed with nominal values specified for the wafer.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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