Další formáty:
BibTeX
LaTeX
RIS
@proceedings{1639682,
author = {Anguš, Michal and Blahová, Lucie and Michlíček, Miroslav and Zajíčková, Lenka},
booktitle = {1st Annual CEITEC Postdoc Retreat},
keywords = {Optical Emission Spectroscopy; Argon and Argon Cyclopropylamine Mixture},
language = {eng},
title = {Optical Emission Spectroscopy of Argon and Argon Cyclopropylamine Mixture},
year = {2019}
}
TY - CONF
ID - 1639682
AU - Anguš, Michal - Blahová, Lucie - Michlíček, Miroslav - Zajíčková, Lenka
PY - 2019
TI - Optical Emission Spectroscopy of Argon and Argon Cyclopropylamine Mixture
KW - Optical Emission Spectroscopy
KW - Argon and Argon Cyclopropylamine Mixture
N2 - Optical emission spectroscopy is a technique for analysis of optical radiation from plasma source (or other light sources). In this contribution we are studying light emission from argon and argon cyclopropylamine (CPA) mixture in capacitively coupled plasma generated in plasma enhanced chemical vapor deposition reactor R4 at CEITEC Nano. Pressure inside of the reactor was 50 Pa (Ar flow 10 sccm and for mixture Ar flow 10 sccm and CPA flow 1 sccm) and power was set for 5 W and 50 W for both cases. Recording of spectra was done using Andor Shamrock SR-500i coupled with Newton 971 EMCCD spectroscopic detector. Measured spectral range was from 200 nm to 1000 nm. In all measured spectra we focused on detection and identification of Argon atomic lines. In Ar–CPA mixture we observe emission of molecular fragments as well. Plasma parameter (electron temperature) using Boltzmann plot have been estimated. All argon atomic line parameters have been taken from NIST atomic spectra database1. From the results we can observe similar electron temperature for 5 W and 50 W measurements, but slight increase of temperature in case of Ar-CPA mixture.
ER -
ANGUŠ, Michal, Lucie BLAHOVÁ, Miroslav MICHLÍČEK a Lenka ZAJÍČKOVÁ. Optical Emission Spectroscopy of Argon and Argon Cyclopropylamine Mixture. In \textit{1st Annual CEITEC Postdoc Retreat}. 2019.
|
