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@inproceedings{1644756,
author = {Homola, Vojtěch and Buršíková, Vilma and Kelar, Lukáš and Kelarová, Štěpánka and Stupavská, Monika and Peřina, Vratislav},
address = {SLEZSKA},
booktitle = {9TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION (NANOCON 2017)},
keywords = {PECVD; hexamethyldisiloxane; oxygen; mechanical properties},
howpublished = {elektronická verze "online"},
language = {eng},
location = {SLEZSKA},
isbn = {978-80-87294-81-9},
pages = {831-835},
publisher = {TANGER LTD},
title = {PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS},
url = {https://invenio.nusl.cz/record/387685},
year = {2018}
}
TY - JOUR
ID - 1644756
AU - Homola, Vojtěch - Buršíková, Vilma - Kelar, Lukáš - Kelarová, Štěpánka - Stupavská, Monika - Peřina, Vratislav
PY - 2018
TI - PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS
PB - TANGER LTD
CY - SLEZSKA
SN - 9788087294819
KW - PECVD
KW - hexamethyldisiloxane
KW - oxygen
KW - mechanical properties
UR - https://invenio.nusl.cz/record/387685
L2 - https://invenio.nusl.cz/record/387685
N2 - The deposition of organosilicone thin films from mixture of hexamethyldisiloxane (HMDSO) and oxygen by using capacitively coupled R.F. glow discharges under dusty plasma conditions was investigated. High resolution topography and mechanical property maps of the prepared films were acquired by using atomic force microscopy techniques. The chemical bond and composition of the deposited films were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). The mechanical properties of the films were studied using quasistatic as well as dynamic nanoindentation tests and their surface free energies were evaluated by means of contact angle measuring technique using several testing liquids exhibiting various surface tensions. The thermal stability of the films was studied using thermal desorption spectroscopy. Neural network modelling was used to study the effect of plasma parameters on the hardness of ppHMDSO films.
ER -
HOMOLA, Vojtěch, Vilma BURŠÍKOVÁ, Lukáš KELAR, Štěpánka KELAROVÁ, Monika STUPAVSKÁ a Vratislav PEŘINA. PREPARATION OF PPHMDSO THIN FILMS IN CAPACITIVELY COUPLED RF GLOW DISCHARGES UNDER DUSTY PLASMA CONDITIONS. Online. In \textit{9TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH \&{}amp; APPLICATION (NANOCON 2017)}. SLEZSKA: TANGER LTD, 2018, s.~831-835. ISBN~978-80-87294-81-9.
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