MATĚJKA, Milan, Stanislav KRÁTKÝ, Tomáš ŘIHÁČEK, Alexandr KNÁPEK a Vladimír KOLAŘÍK. Functional nano-structuring of thin silicon nitride membranes. Journal of Electrical Engineering. Slovenská technická univezita v Bratislavě, 2020, roč. 71, č. 2, s. 127-130. ISSN 1335-3632. Dostupné z: https://dx.doi.org/10.2478/jee-2020-0019.
@article{1657596, author = {Matějka, Milan and Krátký, Stanislav and Řiháček, Tomáš and Knápek, Alexandr and Kolařík, Vladimír}, article_number = {2}, doi = {http://dx.doi.org/10.2478/jee-2020-0019}, keywords = {membrane, nano optical device, electron optics, electron beam lithography, silicon nitride, reactive ion etching, silicon etching, microfabrication}, language = {eng}, issn = {1335-3632}, journal = {Journal of Electrical Engineering}, title = {Functional nano-structuring of thin silicon nitride membranes}, url = {https://sciendo.com/article/10.2478/jee-2020-0019}, volume = {71}, year = {2020} }
TY - JOUR ID - 1657596 AU - Matějka, Milan - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír PY - 2020 TI - Functional nano-structuring of thin silicon nitride membranes JF - Journal of Electrical Engineering VL - 71 IS - 2 SP - 127-130 EP - 127-130 PB - Slovenská technická univezita v Bratislavě SN - 13353632 KW - membrane, nano optical device, electron optics, electron beam lithography, silicon nitride, reactive ion etching, silicon etching, microfabrication UR - https://sciendo.com/article/10.2478/jee-2020-0019 ER -
MATĚJKA, Milan, Stanislav KRÁTKÝ, Tomáš ŘIHÁČEK, Alexandr KNÁPEK a Vladimír KOLAŘÍK. Functional nano-structuring of thin silicon nitride membranes. \textit{Journal of Electrical Engineering}. Slovenská technická univezita v Bratislavě, 2020, roč.~71, č.~2, s.~127-130. ISSN~1335-3632. Dostupné z: https://dx.doi.org/10.2478/jee-2020-0019.