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@article{1755516,
author = {Mascaretti, Luca and Barman, Tapan and Münz, Filip and Bricchi, Beatrice Roberta},
article_number = {554},
doi = {http://dx.doi.org/10.1016/j.apsusc.2021.149543},
keywords = {Titanium nitride thin films,Magnetron sputtering,Plasmonics,Spectroscopic ellipsometry,Electrical resistivity},
issn = {0169-4332},
journal = {Applied Surface Science},
title = {Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering},
volume = {2021},
year = {2021}
}
TY - JOUR
ID - 1755516
AU - Mascaretti, Luca - Barman, Tapan - Münz, Filip - Bricchi, Beatrice Roberta
PY - 2021
TI - Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering
JF - Applied Surface Science
VL - 2021
IS - 554
SP - 149543
EP - 149543
PB - Elsevier Science
SN - 01694332
KW - Titanium nitride thin films,Magnetron sputtering,Plasmonics,Spectroscopic ellipsometry,Electrical resistivity
N2 - We report the effect of radiofrequency (RF) substrate biasing during the sputtering process on the structural, optical and electrical properties of TiN films. We employ spectroscopic ellipsometry as a sensible characterization method and we show that a moderate RF power, despite reducing the grain size, allows to achieve optimal plasmonic quality factors and a low resistivity.
ER -
MASCARETTI, Luca, Tapan BARMAN, Filip MÜNZ a Beatrice Roberta BRICCHI. Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering. \textit{Applied Surface Science}. Elsevier Science, 2021, roč.~2021, č.~554, s.~149543-149551. ISSN~0169-4332. Dostupné z: https://dx.doi.org/10.1016/j.apsusc.2021.149543.
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