Dynamics of bipolar HiPIMS discharges by plasma potential probe
measurements

J 2022

Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements

ZANÁŠKA, Michal, Daniel LUNDIN, Nils BRENNING, Hao DU, Pavel DVOŘÁK et. al.

Základní údaje

Originální název

Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements

Autoři

ZANÁŠKA, Michal (garant), Daniel LUNDIN, Nils BRENNING, Hao DU, Pavel DVOŘÁK (203 Česká republika, domácí), Petr VAŠINA (203 Česká republika, domácí) a Ulf HELMERSSON

Vydání

Plasma Sources Science and Technology, IOP Publishing Ltd. 2022, 0963-0252

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Velká Británie a Severní Irsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 3.800

Kód RIV

RIV/00216224:14310/22:00119622

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1088/1361-6595/ac4b65

UT WoS

000757007300001

Klíčová slova anglicky

high-power impulse magnetron sputtering; bipolar HiPIMS; plasma potential; ion acceleration

Štítky

rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 27. 2. 2024 13:30, Mgr. Marie Šípková, DiS.

Anotace

V originále

The plasma potential at a typical substrate position is studied during the positive pulse of a bipolar high-power impulse magnetron sputtering (bipolar HiPIMS) discharge with a Cu target. The goal of the study is to identify suitable conditions for achieving ion acceleration independent on substrate grounding. We find that the time-evolution of the plasma potential during the positive pulse can be separated into several distinct phases, which are highly dependent on the discharge conditions. This includes exploring the influence of the working gas pressure (0.3 – 2 Pa), HiPIMS peak current (10 – 70 A corresponding to 0.5 – 3.5 A/cm2), HiPIMS pulse length (5 – 60 μs) and the amplitude of the positive voltage U+ applied during the positive pulse (0 – 150 V). At low enough pressure, high enough HiPIMS peak current and long enough HiPIMS pulse length, the plasma potential at a typical substrate position is seen to be close to 0 V for a certain time interval (denoted phase B) during the positive pulse. At the same time, spatial mapping of the plasma potential inside the magnetic trap region revealed an elevated value of the plasma potential during phase B. These two plasma potential characteristics are identified as suitable for achieving ion acceleration in the target region. Moreover, by investigating the target current and ion saturation current at the chamber walls, we describe a simple theory linking the value of the plasma potential profile to the ratio of the available target electron current and ion saturation current at the wall.

Návaznosti

GA19-00579S, projekt VaV

Název: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

Investor: Grantová agentura ČR, Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

90097, velká výzkumná infrastruktura

Název: CEPLANT

Citovat

ZANÁŠKA, Michal, Daniel LUNDIN, Nils BRENNING, Hao DU, Pavel DVOŘÁK, Petr VAŠINA a Ulf HELMERSSON. Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements. Plasma Sources Science and Technology. IOP Publishing Ltd., 2022, roč. 31, č. 2, s. 1-19. ISSN 0963-0252. Dostupné z: https://dx.doi.org/10.1088/1361-6595/ac4b65.

@article{1827777,
   author = {Zanáška, Michal and Lundin, Daniel and Brenning, Nils and Du, Hao and Dvořák, Pavel and Vašina, Petr and Helmersson, Ulf},
   article_number = {2},
   doi = {http://dx.doi.org/10.1088/1361-6595/ac4b65},
   keywords = {high-power impulse magnetron sputtering; bipolar HiPIMS; plasma potential; ion acceleration},
   language = {eng},
   issn = {0963-0252},
   journal = {Plasma Sources Science and Technology},
   title = {Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements},
   url = {https://doi.org/10.1088/1361-6595/ac4b65},
   volume = {31},
   year = {2022}
}

TY  - JOUR
ID  - 1827777
AU  - Zanáška, Michal - Lundin, Daniel - Brenning, Nils - Du, Hao - Dvořák, Pavel - Vašina, Petr - Helmersson, Ulf
PY  - 2022
TI  - Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements
JF  - Plasma Sources Science and Technology
VL  - 31
IS  - 2
SP  - 1-19
EP  - 1-19
PB  - IOP Publishing Ltd.
SN  - 09630252
KW  - high-power impulse magnetron sputtering
KW  - bipolar HiPIMS
KW  - plasma potential
KW  - ion acceleration
UR  - https://doi.org/10.1088/1361-6595/ac4b65
N2  - The plasma potential at a typical substrate position is studied during the positive pulse of a bipolar high-power impulse magnetron sputtering (bipolar HiPIMS) discharge with a Cu target. The goal of the study is to identify suitable conditions for achieving ion acceleration independent on substrate grounding. We find that the time-evolution of the plasma potential during the positive pulse can be separated into several distinct phases, which are highly dependent on the discharge conditions. This includes exploring the influence of the working gas pressure (0.3 – 2 Pa), HiPIMS peak current (10 – 70 A corresponding to 0.5 – 3.5 A/cm2), HiPIMS pulse length (5 – 60 μs) and the amplitude of the positive voltage U+ applied during the positive pulse (0 – 150 V). At low enough pressure, high enough HiPIMS peak current and long enough HiPIMS pulse length, the plasma potential at a typical substrate position is seen to be close to 0 V for a certain time interval (denoted phase B) during the positive pulse. At the same time, spatial mapping of the plasma potential inside the magnetic trap region revealed an elevated value of the plasma potential during phase B. These two plasma potential characteristics are identified as suitable for achieving ion acceleration in the target region. Moreover, by investigating the target current and ion saturation current at the chamber walls, we describe a simple theory linking the value of the plasma potential profile to the ratio of the available target electron current and ion saturation current at the wall.
ER  -

ZANÁŠKA, Michal, Daniel LUNDIN, Nils BRENNING, Hao DU, Pavel DVOŘÁK, Petr VAŠINA a Ulf HELMERSSON. Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements. \textit{Plasma Sources Science and Technology}. IOP Publishing Ltd., 2022, roč.~31, č.~2, s.~1-19. ISSN~0963-0252. Dostupné z: https://dx.doi.org/10.1088/1361-6595/ac4b65.

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