ZAJÍČKOVÁ, Lenka, Ivan OHLÍDAL and Jan JANČA. Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses. Thin Solid Films. UK Oxford: Elsevier science, 1996, vol. 1996, No 280, p. 26-36. ISSN 0040-6090.
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Basic information
Original name Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses
Authors ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Ivan OHLÍDAL (203 Czech Republic) and Jan JANČA (203 Czech Republic).
Edition Thin Solid Films, UK Oxford, Elsevier science, 1996, 0040-6090.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/96:00000441
Organization unit Faculty of Science
Keywords in English PECVD; TEOS
Tags PECVD, TEOS
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 17/7/2007 17:04.
Links
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
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