| ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ a Daniel FRANTA. The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films. Czechoslovak Journal of Physics. Praha, 1999, roč. 49, č. 8, s. 1213-1228. ISSN 0011-4626. |
Další formáty:
BibTeX
LaTeX
RIS
@article{207851,
author = {Zajíčková, Lenka and Buršíková, Vilma and Franta, Daniel},
article_location = {Praha},
article_number = {8},
language = {eng},
issn = {0011-4626},
journal = {Czechoslovak Journal of Physics},
title = {The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films},
url = {http://hydra.physics.muni.cz/~franta/bib/CJP49_1213.html},
volume = {49},
year = {1999}
}
TY - JOUR
ID - 207851
AU - Zajíčková, Lenka - Buršíková, Vilma - Franta, Daniel
PY - 1999
TI - The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films
JF - Czechoslovak Journal of Physics
VL - 49
IS - 8
SP - 1213
EP - 1213
SN - 00114626
UR - http://hydra.physics.muni.cz/~franta/bib/CJP49_1213.html
N2 - In a planar capacitively coupled RF reactor we deposited DLC films from the mixture of methane and argon. The self biased electrode was in a poor thermal contact with walls of the reactor, neither water cooled nor electrical heated by a special external circuit. The temperatures were continuously increasing even during the longest deposition time of 120 min and differed for the electrode and the silicons of different specific resistances correlated to their emissivities. Ellipsometric and reflectance measurements of films deposited on two different silicon substrates of different emissivities were carried out. Their deposition rate depended significantly on the silicon emissivities because of the different temperatures. The influence of the silicon substrate emissivity on the mechanical properties of DLC films were studied by means of Vickers microhardness tester.
ER -
ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ a Daniel FRANTA. The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films. \textit{Czechoslovak Journal of Physics}. Praha, 1999, roč.~49, č.~8, s.~1213-1228. ISSN~0011-4626.
|
