Comparison of different atmospheric-pressure plasma sources for
controlled decomposition of organic thin-films

a 2022

Comparison of different atmospheric-pressure plasma sources for controlled decomposition of organic thin-films

SIHELNÍK, Slavomír, Oliver BEIER, Ali JAMAATI KENARI, Jun XU, Thomas SEEMANN et. al.

Základní údaje

Originální název

Comparison of different atmospheric-pressure plasma sources for controlled decomposition of organic thin-films

Autoři

SIHELNÍK, Slavomír, Oliver BEIER, Ali JAMAATI KENARI, Jun XU, Thomas SEEMANN, Bjoern KRETZSCHMAR, Andreas PFUCH, Sebastian SPANGE, Richard KRUMPOLEC a Dušan KOVÁČIK

Vydání

NANOCON 2022: 14th International Conference on Nanomaterials – Research & Application, 2022

Další údaje

Jazyk

angličtina

Typ výsledku

Konferenční abstrakt

Obor

10305 Fluids and plasma physics

Stát vydavatele

Česká republika

Utajení

není předmětem státního či obchodního tajemství

Organizační jednotka

Přírodovědecká fakulta

ISBN

978-80-88365-07-5

Klíčová slova anglicky

plasma; etching; thin-films; stearic acid; glass

Změněno: 6. 12. 2022 09:30, Mgr. Marie Šípková, DiS.

Anotace

V originále

Nanostructured materials are attractive for applications in many industries that demand low-cost manufacturing. Thin-films based on organics are easy to process thanks to their solubility and flexibility, which is advantageous for implementation into mass production. Nowadays, thin organic-based films are successfully used in optical and electronic devices that are made via two basic approaches: bottom-up and top-down. The present study compares various nonthermal plasma sources as tools for removal of organic layers in the scope of top-down methods. Atmospheric-pressure plasma etching is proposed here as a dry, efficient and controllable method for decomposition of organic nanolayers with respect to their thickness without affecting the substrate material. The selection of applied plasma sources is based on different geometry, power input or working and surrounding gas, with respect to areal uniformity and thermal sensitivity of organic coatings. Stearic acid (SA) layers were evaporated on soda-lime glass substrates. Initial layer thickness of 70 nm was evaluated using confocal profilometry. Water contact angle measurements (WCA) of plasma-activated glass were carried out to optimize plasma parameters suitable for efficient decomposition. FTIR analysis was used for detection of SA layer decomposition after plasma exposure. XPS was carried out to reveal the chemical nature of parallel mechanisms involved in plasma-glass interaction. The impact of the tested plasmas on the morphology of soda-lime glass substrate was analysed using AFM.

Návaznosti

LM2018097, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav (Akronym: CEPLANT)

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

Citovat

SIHELNÍK, Slavomír, Oliver BEIER, Ali JAMAATI KENARI, Jun XU, Thomas SEEMANN, Bjoern KRETZSCHMAR, Andreas PFUCH, Sebastian SPANGE, Richard KRUMPOLEC a Dušan KOVÁČIK. Comparison of different atmospheric-pressure plasma sources for controlled decomposition of organic thin-films. In NANOCON 2022: 14th International Conference on Nanomaterials – Research & Application. 2022. ISBN 978-80-88365-07-5.

@proceedings{2237470,
   author = {Sihelník, Slavomír and Beier, Oliver and Jamaati Kenari, Ali and Xu, Jun and Seemann, Thomas and Kretzschmar, Bjoern and Pfuch, Andreas and Spange, Sebastian and Krumpolec, Richard and Kováčik, Dušan},
   booktitle = {NANOCON 2022: 14th International Conference on Nanomaterials – Research & Application},
   keywords = {plasma; etching; thin-films; stearic acid; glass},
   language = {eng},
   isbn = {978-80-88365-07-5},
   title = {Comparison of different atmospheric-pressure plasma sources for controlled decomposition of organic thin-films},
   year = {2022}
}

TY  - CONF
ID  - 2237470
AU  - Sihelník, Slavomír - Beier, Oliver - Jamaati Kenari, Ali - Xu, Jun - Seemann, Thomas - Kretzschmar, Bjoern - Pfuch, Andreas - Spange, Sebastian - Krumpolec, Richard - Kováčik, Dušan
PY  - 2022
TI  - Comparison of different atmospheric-pressure plasma sources for controlled decomposition of organic thin-films
SN  - 9788088365075
KW  - plasma
KW  - etching
KW  - thin-films
KW  - stearic acid
KW  - glass
N2  - Nanostructured materials are attractive for applications in many industries that demand low-cost manufacturing. Thin-films based on organics are easy to process thanks to their solubility and flexibility, which is advantageous for implementation into mass production. Nowadays, thin organic-based films are successfully used in optical and electronic devices that are made via two basic approaches: bottom-up and top-down. The present study compares various nonthermal plasma sources as tools for removal of organic layers in the scope of top-down methods. Atmospheric-pressure plasma etching is proposed here as a dry, efficient and controllable method for decomposition of organic nanolayers with respect to their thickness without affecting the substrate material. The selection of applied plasma sources is based on different geometry, power input or working and surrounding gas, with respect to areal uniformity and thermal sensitivity of organic coatings. Stearic acid (SA) layers were evaporated on soda-lime glass substrates. Initial layer thickness of 70 nm was evaluated using confocal profilometry. Water contact angle measurements (WCA) of plasma-activated glass were carried out to optimize plasma parameters suitable for efficient decomposition. FTIR analysis was used for detection of SA layer decomposition after plasma exposure. XPS was carried out to reveal the chemical nature of parallel mechanisms involved in plasma-glass interaction. The impact of the tested plasmas on the morphology of soda-lime glass substrate was analysed using AFM.
ER  -

SIHELNÍK, Slavomír, Oliver BEIER, Ali JAMAATI KENARI, Jun XU, Thomas SEEMANN, Bjoern KRETZSCHMAR, Andreas PFUCH, Sebastian SPANGE, Richard KRUMPOLEC a Dušan KOVÁČIK. Comparison of different atmospheric-pressure plasma sources for controlled decomposition of organic thin-films. In \textit{NANOCON 2022: 14th International Conference on Nanomaterials – Research \&{} Application}. 2022. ISBN~978-80-88365-07-5.

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