| KELAROVÁ, Štěpánka, Roman PŘIBYL, Vojtěch HOMOLA, Josef POLČÁK, Anna CHARVÁTOVÁ CAMPBELL, Marek HAVLÍČEK, Kateřina VRCHOVECKÁ, Richard VÁCLAVIK, Lukáš ZÁBRANSKÝ a Vilma BURŠÍKOVÁ. Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures. Vacuum. Elsevier, 2023, roč. 207, January, s. 1-12. ISSN 0042-207X. Dostupné z: https://dx.doi.org/10.1016/j.vacuum.2022.111634. |
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@article{2239461,
author = {Kelarová, Štěpánka and Přibyl, Roman and Homola, Vojtěch and Polčák, Josef and Charvátová Campbell, Anna and Havlíček, Marek and Vrchovecká, Kateřina and Václavik, Richard and Zábranský, Lukáš and Buršíková, Vilma},
article_number = {January},
doi = {http://dx.doi.org/10.1016/j.vacuum.2022.111634},
keywords = {Trimethylsilyl acetate; PECVD; Low pressure RF glow discharge; Plasma polymers; Stability},
language = {eng},
issn = {0042-207X},
journal = {Vacuum},
title = {Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures},
url = {https://www.sciencedirect.com/science/article/pii/S0042207X22007564},
volume = {207},
year = {2023}
}
TY - JOUR
ID - 2239461
AU - Kelarová, Štěpánka - Přibyl, Roman - Homola, Vojtěch - Polčák, Josef - Charvátová Campbell, Anna - Havlíček, Marek - Vrchovecká, Kateřina - Václavik, Richard - Zábranský, Lukáš - Buršíková, Vilma
PY - 2023
TI - Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures
JF - Vacuum
VL - 207
IS - January
SP - 1-12
EP - 1-12
PB - Elsevier
SN - 0042207X
KW - Trimethylsilyl acetate
KW - PECVD
KW - Low pressure RF glow discharge
KW - Plasma polymers
KW - Stability
UR - https://www.sciencedirect.com/science/article/pii/S0042207X22007564
N2 - Capacitively coupled RF glow discharge was used to form novel coatings of SiOxCyHz using varying proportions of trimethylsilyl acetate (TMSAc) monomer and the carrier gas argon. The properties of the TMSAc-based plasma polymers produced depend significantly on the proportion of argon in TMSAc/Ar gaseous mixture, which ranged from 0 % to 75 %. Reaction mixtures containing less than 50 % Ar produced hydrophobic polymers, for which the indentation hardness values were less than 1.5 GPa. Seventy-five percent argon in the reaction mixture yielded a crosslinked carbon-rich organosilicon structure with a hardness of 6 GPa. As many applications require good stability in a liquid environment, the TMSAc-based coatings were immersed in phosphate buffered saline (PBS) for 14 days. Because any material used in a medical application must be resistant to the techniques used for sterilization, the prepared coatings were subjected to a standard sterilization procedure using UVC radiation. A degree of the structural changes induced by both environments corresponded to the argon ratio used for production of thin films. Possible degradation mechanisms were examined and discussed. Using 7.7–21.4 % Ar during the deposition process led to the TMSAc-based plasma polymers exhibiting good resistance to the prolonged immersion in PBS and UVC sterilization.
ER -
KELAROVÁ, Štěpánka, Roman PŘIBYL, Vojtěch HOMOLA, Josef POLČÁK, Anna CHARVÁTOVÁ CAMPBELL, Marek HAVLÍČEK, Kateřina VRCHOVECKÁ, Richard VÁCLAVIK, Lukáš ZÁBRANSKÝ a Vilma BURŠÍKOVÁ. Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures. \textit{Vacuum}. Elsevier, 2023, roč.~207, January, s.~1-12. ISSN~0042-207X. Dostupné z: https://dx.doi.org/10.1016/j.vacuum.2022.111634.
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