Growth-rate model of epitaxial layer-by-layer growth by
pulsed-laser deposition

J 2022

Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition

GABRIEL, Vít, Pavel KOCÁN a Václav HOLÝ

Základní údaje

Originální název

Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition

Autoři

GABRIEL, Vít (garant), Pavel KOCÁN a Václav HOLÝ (203 Česká republika, domácí)

Vydání

Physical Review E, American Physical Society, 2022, 2470-0045

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10302 Condensed matter physics

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 2.400

Kód RIV

RIV/00216224:14310/22:00128099

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1103/PhysRevE.106.035302

UT WoS

000874981300004

Klíčová slova anglicky

Growth; Nucleation on surfaces; Thin films; Mean-field and cluster methods

Štítky

rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 18. 1. 2023 14:10, Mgr. Marie Šípková, DiS.

Anotace

V originále

We present a numerical model of epitaxial thin-film growth applicable for pulsed-laser deposition on a single crystalline substrate. The model is based on rate equations describing the time development of monolayer coverages and of densities of movable particles on atomically flat terraces. Numerical solution of the equations showed that the time dependence of surface roughness obeys a scaling law, the exponent of which depends on probabilities of various atomistic processes included in the simulation model. From the time dependence of monolayer coverages we calculated x-ray diffracted intensity in a quasiforbidden anti-Bragg reflection and showed that its oscillatory behavior is affected by these probabilities as well. The results show the possibility to study atomistic processes during the deposition from the time dependence of the anti-Bragg intensity measured during deposition.

Citovat

GABRIEL, Vít, Pavel KOCÁN a Václav HOLÝ. Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition. Physical Review E. American Physical Society, 2022, roč. 106, č. 3, s. 1-9. ISSN 2470-0045. Dostupné z: https://dx.doi.org/10.1103/PhysRevE.106.035302.

@article{2247615,
   author = {Gabriel, Vít and Kocán, Pavel and Holý, Václav},
   article_number = {3},
   doi = {http://dx.doi.org/10.1103/PhysRevE.106.035302},
   keywords = {Growth; Nucleation on surfaces; Thin films; Mean-field and cluster methods},
   language = {eng},
   issn = {2470-0045},
   journal = {Physical Review E},
   title = {Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition},
   url = {https://journals.aps.org/pre/abstract/10.1103/PhysRevE.106.035302},
   volume = {106},
   year = {2022}
}

TY  - JOUR
ID  - 2247615
AU  - Gabriel, Vít - Kocán, Pavel - Holý, Václav
PY  - 2022
TI  - Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition
JF  - Physical Review E
VL  - 106
IS  - 3
SP  - 1-9
EP  - 1-9
PB  - American Physical Society
SN  - 24700045
KW  - Growth
KW  - Nucleation on surfaces
KW  - Thin films
KW  - Mean-field and cluster methods
UR  - https://journals.aps.org/pre/abstract/10.1103/PhysRevE.106.035302
N2  - We present a numerical model of epitaxial thin-film growth applicable for pulsed-laser deposition on a single crystalline substrate. The model is based on rate equations describing the time development of monolayer coverages and of densities of movable particles on atomically flat terraces. Numerical solution of the equations showed that the time dependence of surface roughness obeys a scaling law, the exponent of which depends on probabilities of various atomistic processes included in the simulation model. From the time dependence of monolayer coverages we calculated x-ray diffracted intensity in a quasiforbidden anti-Bragg reflection and showed that its oscillatory behavior is affected by these probabilities as well. The results show the possibility to study atomistic processes during the deposition from the time dependence of the anti-Bragg intensity measured during deposition.
ER  -

GABRIEL, Vít, Pavel KOCÁN a Václav HOLÝ. Growth-rate model of epitaxial layer-by-layer growth by pulsed-laser deposition. \textit{Physical Review E}. American Physical Society, 2022, roč.~106, č.~3, s.~1-9. ISSN~2470-0045. Dostupné z: https://dx.doi.org/10.1103/PhysRevE.106.035302.

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