KLEIN, Peter, Jaroslav HNILICA, V SOCHORA a Petr VAŠINA. Enhancing the ionized metal flux fraction in industrial conditions. In 66th Annual SVC Technical Conference. 2023.
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Základní údaje
Originální název Enhancing the ionized metal flux fraction in industrial conditions
Autoři KLEIN, Peter, Jaroslav HNILICA, V SOCHORA a Petr VAŠINA.
Vydání 66th Annual SVC Technical Conference, 2023.
Další údaje
Originální jazyk angličtina
Typ výsledku Konferenční abstrakt
Stát vydavatele Spojené státy
Utajení není předmětem státního či obchodního tajemství
Organizační jednotka Přírodovědecká fakulta
Klíčová slova anglicky magnetron; sputtering; industrial; ionmeter
Příznaky Mezinárodní význam
Změnil Změnil: doc. Mgr. Jaroslav Hnilica, Ph.D., učo 106259. Změněno: 8. 1. 2024 12:43.
Anotace
This work presents a significant enhancement of the ionized metal flux fraction (IMFF) during direct current magnetron sputtering using lateral glow discharge (LGD). A biasable quartz crystal microbalance (QCM) and Langmuir probe measuring saturated ionic current were utilized for the measurement. The experiments were conducted in the industrial DRAK sputtering system developed by the SHM company equipped with a cathode utilizing a titanium cylindrical rotating target with a racetrack area of approx. 100 cm2. The sputtering cathode was positioned in the central door position and was sputtering onto the carousel sample holder. Additionally, two electrodes for the LGD situated on the left and right from the magnetron cathode, all in the door positions, were creating a supplementary discharge in front of the magnetron. Biased QCM and Langmuir probe were fitted onto the carousel facing the magnetron sputtering source. A systematical study with varying pressure, power on magnetron and current through LGD was conducted. Results show that for 20kW DC on the magnetron, 12% of IMFF on the substrate position is reached, a value that is in direct contrast to the generally assumed low single percent. This is achieved via high current density and very efficient cooling of the sputtering cathode. With additional LGD, this value increases to 23%, which is extremely high, comparable to high power impulse magnetron sputtering (HiPIMS) technology. Additionally, it was found that IMFF enhancement through the LGD is more efficient the higher the pressure in the chamber.
Návaznosti
FW03010533, projekt VaVNázev: Numerické modely pro optimalizaci inovativních supertvrdých materiálů
Investor: Technologická agentura ČR, Numerické modely pro optimalizaci inovativních supertvrdých materiálů, Podprogram 1 "Technologičtí lídři"
VytisknoutZobrazeno: 12. 10. 2024 02:21