On direct-current magnetron sputtering at industrial conditions
with high ionization fraction of sputtered species

J 2024

On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

HNILICA, Jaroslav, Peter KLEIN, Martin UČÍK, Stanislava DEBNÁROVÁ, Jan KLUSOŇ et. al.

Základní údaje

Originální název

On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

Autoři

HNILICA, Jaroslav (203 Česká republika, garant, domácí), Peter KLEIN (703 Slovensko, domácí), Martin UČÍK (203 Česká republika, domácí), Stanislava DEBNÁROVÁ (703 Slovensko, domácí), Jan KLUSOŇ a Petr VAŠINA (203 Česká republika, domácí)

Vydání

Surface and Coatings Technology, Elsevier B.V. 2024, 0257-8972

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10300 1.3 Physical sciences

Stát vydavatele

Švýcarsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 5.400 v roce 2022

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1016/j.surfcoat.2024.131028

UT WoS

001260010200001

Klíčová slova anglicky

Titanium; Magnetron sputtering; Industry; HiPIMS; Coatings

Štítky

rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 17. 7. 2024 10:26, Mgr. Marie Šípková, DiS.

Anotace

V originále

In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position.

Návaznosti

LM2023039, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

Citovat

HNILICA, Jaroslav, Peter KLEIN, Martin UČÍK, Stanislava DEBNÁROVÁ, Jan KLUSOŇ a Petr VAŠINA. On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species. Surface and Coatings Technology. Elsevier B.V., 2024, roč. 487, July 2024, s. 1-7. ISSN 0257-8972. Dostupné z: https://dx.doi.org/10.1016/j.surfcoat.2024.131028.

@article{2417346,
   author = {Hnilica, Jaroslav and Klein, Peter and Učík, Martin and Debnárová, Stanislava and Klusoň, Jan and Vašina, Petr},
   article_number = {July 2024},
   doi = {http://dx.doi.org/10.1016/j.surfcoat.2024.131028},
   keywords = {Titanium; Magnetron sputtering; Industry; HiPIMS; Coatings},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface and Coatings Technology},
   title = {On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species},
   url = {https://www.sciencedirect.com/science/article/pii/S0257897224006595},
   volume = {487},
   year = {2024}
}

TY  - JOUR
ID  - 2417346
AU  - Hnilica, Jaroslav - Klein, Peter - Učík, Martin - Debnárová, Stanislava - Klusoň, Jan - Vašina, Petr
PY  - 2024
TI  - On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species
JF  - Surface and Coatings Technology
VL  - 487
IS  - July 2024
SP  - 1-7
EP  - 1-7
PB  - Elsevier B.V.
SN  - 02578972
KW  - Titanium
KW  - Magnetron sputtering
KW  - Industry
KW  - HiPIMS
KW  - Coatings
UR  - https://www.sciencedirect.com/science/article/pii/S0257897224006595
N2  - In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position.
ER  -

HNILICA, Jaroslav, Peter KLEIN, Martin UČÍK, Stanislava DEBNÁROVÁ, Jan KLUSOŇ a Petr VAŠINA. On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species. \textit{Surface and Coatings Technology}. Elsevier B.V., 2024, roč.~487, July 2024, s.~1-7. ISSN~0257-8972. Dostupné z: https://dx.doi.org/10.1016/j.surfcoat.2024.131028.

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