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@article{2420037,
author = {Klein, Peter and Hnilica, Jaroslav and Sochora, Vjačeslav and Souček, Pavel and Fekete, Matej and Vašina, Petr},
article_number = {August 2024},
doi = {http://dx.doi.org/10.1016/j.surfcoat.2024.131142},
keywords = {Titanium; Magnetron sputtering; Industry; LAD; Coatings; IPVD; HiPIMS},
language = {eng},
issn = {0257-8972},
journal = {Surface and Coatings Technology},
title = {Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering},
url = {https://www.sciencedirect.com/science/article/pii/S0257897224007734?via%3Dihub},
volume = {489},
year = {2024}
}
TY - JOUR
ID - 2420037
AU - Klein, Peter - Hnilica, Jaroslav - Sochora, Vjačeslav - Souček, Pavel - Fekete, Matej - Vašina, Petr
PY - 2024
TI - Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering
JF - Surface and Coatings Technology
VL - 489
IS - August 2024
SP - 1-7
EP - 1-7
PB - Elsevier B.V.
SN - 02578972
KW - Titanium
KW - Magnetron sputtering
KW - Industry
KW - LAD
KW - Coatings
KW - IPVD
KW - HiPIMS
UR - https://www.sciencedirect.com/science/article/pii/S0257897224007734?via%3Dihub
N2 - In industrial magnetron sputtering processes, large DC-driven cathodes are commonly employed. This work reports on industrially compatible technology, which allows for the increase in ionized metal flux fraction on the substrate in a controlled manner without sacrificing the deposition rate. From the long arc cathode positioned on the one-hand side of the magnetron cathode, electrons are drawn towards the anode on the other side. This arrangement induces a large volume secondary discharge that extends along the entire length of the magnetron cathode, effectively ionizing sputtered species as they traverse this discharge towards the substrate. With this setup, while sputtering titanium in an argon atmosphere under industrial conditions, up to 28% of ionized metal flux fraction was achieved on the substrate position. This technology significantly improves the quality of the deposited coating, including hardness, Young’s modulus, roughness and fracture resistance, as shown in the TiN case study.
ER -
KLEIN, Peter, Jaroslav HNILICA, Vjačeslav SOCHORA, Pavel SOUČEK, Matej FEKETE a Petr VAŠINA. Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering. \textit{Surface and Coatings Technology}. Elsevier B.V., 2024, roč.~489, August 2024, s.~1-7. ISSN~0257-8972. Dostupné z: https://dx.doi.org/10.1016/j.surfcoat.2024.131142.
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