Enhancement of ionized metal flux fraction without compromising
deposition rate in industrial magnetron sputtering

J 2024

Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering

KLEIN, Peter, Jaroslav HNILICA, Vjačeslav SOCHORA, Pavel SOUČEK, Matej FEKETE et. al.

Základní údaje

Originální název

Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering

Autoři

KLEIN, Peter (703 Slovensko, domácí), Jaroslav HNILICA (203 Česká republika, domácí), Vjačeslav SOCHORA, Pavel SOUČEK (203 Česká republika, domácí), Matej FEKETE (703 Slovensko, domácí) a Petr VAŠINA (203 Česká republika, domácí)

Vydání

Surface and Coatings Technology, Elsevier B.V. 2024, 0257-8972

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Švýcarsko

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Impakt faktor

Impact factor: 5.400 v roce 2022

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1016/j.surfcoat.2024.131142

UT WoS

001279392200001

Klíčová slova anglicky

Titanium; Magnetron sputtering; Industry; LAD; Coatings; IPVD; HiPIMS

Štítky

rivok

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 9. 8. 2024 09:05, Mgr. Marie Šípková, DiS.

Anotace

V originále

In industrial magnetron sputtering processes, large DC-driven cathodes are commonly employed. This work reports on industrially compatible technology, which allows for the increase in ionized metal flux fraction on the substrate in a controlled manner without sacrificing the deposition rate. From the long arc cathode positioned on the one-hand side of the magnetron cathode, electrons are drawn towards the anode on the other side. This arrangement induces a large volume secondary discharge that extends along the entire length of the magnetron cathode, effectively ionizing sputtered species as they traverse this discharge towards the substrate. With this setup, while sputtering titanium in an argon atmosphere under industrial conditions, up to 28% of ionized metal flux fraction was achieved on the substrate position. This technology significantly improves the quality of the deposited coating, including hardness, Young’s modulus, roughness and fracture resistance, as shown in the TiN case study.

Návaznosti

LM2023039, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

TN02000069, projekt VaV

Název: Národní centrum kompetence pro materiály, pokročilé technologie, povlakování a jejich aplikace

Investor: Technologická agentura ČR, Národní centrum kompetence pro materiály, pokročilé technologie, povlakování a jejich aplikace

Citovat

KLEIN, Peter, Jaroslav HNILICA, Vjačeslav SOCHORA, Pavel SOUČEK, Matej FEKETE a Petr VAŠINA. Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering. Surface and Coatings Technology. Elsevier B.V., 2024, roč. 489, August 2024, s. 1-7. ISSN 0257-8972. Dostupné z: https://dx.doi.org/10.1016/j.surfcoat.2024.131142.

@article{2420037,
   author = {Klein, Peter and Hnilica, Jaroslav and Sochora, Vjačeslav and Souček, Pavel and Fekete, Matej and Vašina, Petr},
   article_number = {August 2024},
   doi = {http://dx.doi.org/10.1016/j.surfcoat.2024.131142},
   keywords = {Titanium; Magnetron sputtering; Industry; LAD; Coatings; IPVD; HiPIMS},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface and Coatings Technology},
   title = {Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering},
   url = {https://www.sciencedirect.com/science/article/pii/S0257897224007734?via%3Dihub},
   volume = {489},
   year = {2024}
}

TY  - JOUR
ID  - 2420037
AU  - Klein, Peter - Hnilica, Jaroslav - Sochora, Vjačeslav - Souček, Pavel - Fekete, Matej - Vašina, Petr
PY  - 2024
TI  - Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering
JF  - Surface and Coatings Technology
VL  - 489
IS  - August 2024
SP  - 1-7
EP  - 1-7
PB  - Elsevier B.V.
SN  - 02578972
KW  - Titanium
KW  - Magnetron sputtering
KW  - Industry
KW  - LAD
KW  - Coatings
KW  - IPVD
KW  - HiPIMS
UR  - https://www.sciencedirect.com/science/article/pii/S0257897224007734?via%3Dihub
N2  - In industrial magnetron sputtering processes, large DC-driven cathodes are commonly employed. This work reports on industrially compatible technology, which allows for the increase in ionized metal flux fraction on the substrate in a controlled manner without sacrificing the deposition rate. From the long arc cathode positioned on the one-hand side of the magnetron cathode, electrons are drawn towards the anode on the other side. This arrangement induces a large volume secondary discharge that extends along the entire length of the magnetron cathode, effectively ionizing sputtered species as they traverse this discharge towards the substrate. With this setup, while sputtering titanium in an argon atmosphere under industrial conditions, up to 28% of ionized metal flux fraction was achieved on the substrate position. This technology significantly improves the quality of the deposited coating, including hardness, Young’s modulus, roughness and fracture resistance, as shown in the TiN case study.
ER  -

KLEIN, Peter, Jaroslav HNILICA, Vjačeslav SOCHORA, Pavel SOUČEK, Matej FEKETE a Petr VAŠINA. Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering. \textit{Surface and Coatings Technology}. Elsevier B.V., 2024, roč.~489, August 2024, s.~1-7. ISSN~0257-8972. Dostupné z: https://dx.doi.org/10.1016/j.surfcoat.2024.131142.

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