Deposition of nanocomposite carbon-based thin films doped with
copper and fluorine

J 2024

Deposition of nanocomposite carbon-based thin films doped with copper and fluorine

PŘIBYL, Roman, Štěpánka KELAROVÁ, Martin KARKUŠ a Vilma BURŠÍKOVÁ

Základní údaje

Originální název

Deposition of nanocomposite carbon-based thin films doped with copper and fluorine

Autoři

PŘIBYL, Roman, Štěpánka KELAROVÁ, Martin KARKUŠ a Vilma BURŠÍKOVÁ

Vydání

Carbon Trends, Elsevier Ltd. 2024, 2667-0569

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Nizozemské království

Utajení

není předmětem státního či obchodního tajemství

Odkazy

URL

Organizační jednotka

Přírodovědecká fakulta

DOI

http://dx.doi.org/10.1016/j.cartre.2024.100416

Klíčová slova anglicky

Thin films; PECVD; Copper doped carbon-based films; Fluorine doped carbon-based films; RF glow discharge

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 29. 10. 2024 11:20, Mgr. Marie Šípková, DiS.

Anotace

V originále

This paper is focused on plasma-enhanced chemical vapor deposition (PECVD) of novel carbon-based thin films. Unique thin films were deposited from a mixture of methane, hydrogen, and a precursor containing fluorine and copper: (hfac)copperVTMS (hfac = hexafluoroacetylacetonato and VTMS = vinyltrimethylsilane). Using the (hfac)copperVTMS precursor in PECVD deposition results in the advantageous chemical composition of carbon-based thin films while maintaining sufficient mechanical properties. Furthermore, with optimized plasma parameters, the films deposited on the substrate exhibit a nanocomposite structure. This nanostructured surface can increase the surface area, which is beneficial for various applications, including antibacterial and antiviral properties. The radiofrequency glow discharge at low pressure (≈ 70 Pa) and power P = 25W and P = 250W was used for deposition. Deposited thin films were analyzed using X-ray photoelectron spectroscopy, water contact angle measurement, atomic force microscopy, and nanoindentation techniques. Despite the doping of carbon-based thin films with soft copper, the prepared films exhibited sufficient mechanical properties, which are crucial for the future implementation of this deposition process.

Návaznosti

LM2023039, projekt VaV

Název: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, R&D centre for plasma and nanotechnology surface modifications

TN01000038, projekt VaV

Název: Národní centrum kompetence pro materiály, pokročilé technologie, povlakování a jejich aplikace (Akronym: MATCA)

Investor: Technologická agentura ČR, Národní centrum kompetence pro materiály, pokročilé technologie, povlakování a jejich aplikace

90096, velká výzkumná infrastruktura

Název: MGML

90251, velká výzkumná infrastruktura

Název: CzechNanoLab II

Citovat

PŘIBYL, Roman, Štěpánka KELAROVÁ, Martin KARKUŠ a Vilma BURŠÍKOVÁ. Deposition of nanocomposite carbon-based thin films doped with copper and fluorine. Carbon Trends. Elsevier Ltd., 2024. ISSN 2667-0569. Dostupné z: https://dx.doi.org/10.1016/j.cartre.2024.100416.

@article{2447117,
   author = {Přibyl, Roman and Kelarová, Štěpánka and Karkuš, Martin and Buršíková, Vilma},
   doi = {http://dx.doi.org/10.1016/j.cartre.2024.100416},
   keywords = {Thin films; PECVD; Copper doped carbon-based films; Fluorine doped carbon-based films; RF glow discharge},
   language = {eng},
   issn = {2667-0569},
   journal = {Carbon Trends},
   title = {Deposition of nanocomposite carbon-based thin films doped with copper and fluorine},
   url = {https://www.sciencedirect.com/science/article/pii/S266705692400097X},
   year = {2024}
}

TY  - JOUR
ID  - 2447117
AU  - Přibyl, Roman - Kelarová, Štěpánka - Karkuš, Martin - Buršíková, Vilma
PY  - 2024
TI  - Deposition of nanocomposite carbon-based thin films doped with copper and fluorine
JF  - Carbon Trends
PB  - Elsevier Ltd.
SN  - 26670569
KW  - Thin films
KW  - PECVD
KW  - Copper doped carbon-based films
KW  - Fluorine doped carbon-based films
KW  - RF glow discharge
UR  - https://www.sciencedirect.com/science/article/pii/S266705692400097X
N2  - This paper is focused on plasma-enhanced chemical vapor deposition (PECVD) of novel carbon-based thin films. Unique thin films were deposited from a mixture of methane, hydrogen, and a precursor containing fluorine and copper: (hfac)copperVTMS (hfac = hexafluoroacetylacetonato and VTMS = vinyltrimethylsilane). Using the (hfac)copperVTMS precursor in PECVD deposition results in the advantageous chemical composition of carbon-based thin films while maintaining sufficient mechanical properties. Furthermore, with optimized plasma parameters, the films deposited on the substrate exhibit a nanocomposite structure. This nanostructured surface can increase the surface area, which is beneficial for various applications, including antibacterial and antiviral properties. The radiofrequency glow discharge at low pressure (≈ 70 Pa) and power P = 25W and P = 250W was used for deposition. Deposited thin films were analyzed using X-ray photoelectron spectroscopy, water contact angle measurement, atomic force microscopy, and nanoindentation techniques. Despite the doping of carbon-based thin films with soft copper, the prepared films exhibited sufficient mechanical properties, which are crucial for the future implementation of this deposition process.
ER  -

PŘIBYL, Roman, Štěpánka KELAROVÁ, Martin KARKUŠ a Vilma BURŠÍKOVÁ. Deposition of nanocomposite carbon-based thin films doped with copper and fluorine. \textit{Carbon Trends}. Elsevier Ltd., 2024. ISSN~2667-0569. Dostupné z: https://dx.doi.org/10.1016/j.cartre.2024.100416.

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