Understanding the effect of pulsed power delivery modes on
reactive sputter deposition process and coating properties
through experimental and plasma simulation studies

J 2025

Understanding the effect of pulsed power delivery modes on reactive sputter deposition process and coating properties through experimental and plasma simulation studies

RANE, Gayatri; Adam OBRUSNÍK; Martin KUBECKA; Kristína TOMANKOVÁ; Philipp DUERRENFELD et. al.

Basic information

Original name

Understanding the effect of pulsed power delivery modes on reactive sputter deposition process and coating properties through experimental and plasma simulation studies

Authors

RANE, Gayatri; Adam OBRUSNÍK (203 Czech Republic, belonging to the institution); Martin KUBECKA; Kristína TOMANKOVÁ (703 Slovakia, belonging to the institution); Philipp DUERRENFELD; Uwe KRAUSE and Denis SHAW

Edition

Surface and Coatings Technology, Elsevier B.V. 2025, 0257-8972

Other information

Language

English

Type of outcome

Article in a journal

Field of Study

10305 Fluids and plasma physics

Country of publisher

Switzerland

Confidentiality degree

is not subject to a state or trade secret

References:

URL

Impact factor

Impact factor: 6.100 in 2024

Organization unit

Faculty of Science

DOI

https://doi.org/10.1016/j.surfcoat.2025.131975

UT WoS

001439455100001

EID Scopus

2-s2.0-85219145165

Keywords in English

Reactive sputter deposition; Sputter power delivery; Plasma simulation; Plasma dynamics

Abstract

In the original language

eactive sputtering of dielectric films with high deposition rate, well-defined optical properties, and low stress over large area substrates has been a continual goal in the field of large area coatings leading to several developments in industrial coating equipment. In recent years, demand for coatings on heat sensitive substrates has led to further innovations in terms of equipment as well as process modifications. Bipolar (BP) pulsed-DC, using dual magnetron sputtering configuration, has been widely used on production scales for several years. A more recent power delivery configuration is the dynamic reverse pulsing (DRP®) mode that can be utilised on existing setups by retrofitting dual magnetron systems with explicit anodes. In this paper, we provide an in-depth comparison of the BP and DRP modes on sputter deposition of silicon nitride films through experimental studies under constant operating conditions for reliable comparability. We observed lowered heat load at the substrate and lower film stress with the DRP mode as compared to the BP mode, for the same applied sputter power. An improved deposition rate could be realised by modifying the anode arrangement in the DRP mode. Plasma simulation studies were performed to gain insights on the plasma dynamics by applying a hybrid numerical method. Simulation results indicated inherent differences in plasma dynamics of the two pulsed modes tested and substantiate the experimental results. As different applications demand stringent and distinct coating requirements, we show that the power delivery mode can be utilised as an additional variable to optimize film properties.

Links

90239, large research infrastructures

Name: CEPLANT II

Cite

RANE, Gayatri; Adam OBRUSNÍK; Martin KUBECKA; Kristína TOMANKOVÁ; Philipp DUERRENFELD; Uwe KRAUSE and Denis SHAW. Understanding the effect of pulsed power delivery modes on reactive sputter deposition process and coating properties through experimental and plasma simulation studies. Surface and Coatings Technology. Elsevier B.V., 2025, vol. 502, April 2025, p. 1-16. ISSN 0257-8972. Available from: https://doi.org/10.1016/j.surfcoat.2025.131975.

@article{2491218,
   author = {Rane, Gayatri and Obrusník, Adam and Kubecka, Martin and Tomanková, Kristína and Duerrenfeld, Philipp and Krause, Uwe and Shaw, Denis},
   article_number = {April 2025},
   doi = {https://doi.org/10.1016/j.surfcoat.2025.131975},
   keywords = {Reactive sputter deposition; Sputter power delivery; Plasma simulation; Plasma dynamics},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface and Coatings Technology},
   title = {Understanding the effect of pulsed power delivery modes on reactive sputter deposition process and coating properties through experimental and plasma simulation studies},
   url = {https://doi.org/10.1016/j.surfcoat.2025.131975},
   volume = {502},
   year = {2025}
}

TY  - JOUR
ID  - 2491218
AU  - Rane, Gayatri - Obrusník, Adam - Kubecka, Martin - Tomanková, Kristína - Duerrenfeld, Philipp - Krause, Uwe - Shaw, Denis
PY  - 2025
TI  - Understanding the effect of pulsed power delivery modes on reactive sputter deposition process and coating properties through experimental and plasma simulation studies
JF  - Surface and Coatings Technology
VL  - 502
IS  - April 2025
SP  - 1-16
EP  - 1-16
PB  - Elsevier B.V.
SN  - 02578972
KW  - Reactive sputter deposition
KW  - Sputter power delivery
KW  - Plasma simulation
KW  - Plasma dynamics
UR  - https://doi.org/10.1016/j.surfcoat.2025.131975
N2  - eactive sputtering of dielectric films with high deposition rate, well-defined optical properties, and low stress over large area substrates has been a continual goal in the field of large area coatings leading to several developments in industrial coating equipment. In recent years, demand for coatings on heat sensitive substrates has led to further innovations in terms of equipment as well as process modifications. Bipolar (BP) pulsed-DC, using dual magnetron sputtering configuration, has been widely used on production scales for several years. A more recent power delivery configuration is the dynamic reverse pulsing (DRP®) mode that can be utilised on existing setups by retrofitting dual magnetron systems with explicit anodes. In this paper, we provide an in-depth comparison of the BP and DRP modes on sputter deposition of silicon nitride films through experimental studies under constant operating conditions for reliable comparability. We observed lowered heat load at the substrate and lower film stress with the DRP mode as compared to the BP mode, for the same applied sputter power. An improved deposition rate could be realised by modifying the anode arrangement in the DRP mode. Plasma simulation studies were performed to gain insights on the plasma dynamics by applying a hybrid numerical method. Simulation results indicated inherent differences in plasma dynamics of the two pulsed modes tested and substantiate the experimental results. As different applications demand stringent and distinct coating requirements, we show that the power delivery mode can be utilised as an additional variable to optimize film properties.
ER  -

RANE, Gayatri; Adam OBRUSNÍK; Martin KUBECKA; Kristína TOMANKOVÁ; Philipp DUERRENFELD; Uwe KRAUSE and Denis SHAW. Understanding the effect of pulsed power delivery modes on reactive sputter deposition process and coating properties through experimental and plasma simulation studies. \textit{Surface and Coatings Technology}. Elsevier B.V., 2025, vol.~502, April 2025, p.~1-16. ISSN~0257-8972. Available from: https://doi.org/10.1016/j.surfcoat.2025.131975.

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