Analysis of Slightly Rough Thin Films by Optical Methods and AFM

FRANTA, Daniel, Ivan OHLÍDAL and Petr KLAPETEK. Analysis of Slightly Rough Thin Films by Optical Methods and AFM. Mikrochim. Acta. Wien: Springer-Verlag, 2000, vol. 132, No 1, p. 443-447. ISSN 0026-3672.

Basic information

• Original name: Analysis of Slightly Rough Thin Films by Optical Methods and AFM
• Authors: FRANTA, Daniel (203 Czech Republic, guarantor), Ivan OHLÍDAL (203 Czech Republic) and Petr KLAPETEK (203 Czech Republic).
• Edition: Mikrochim. Acta, Wien, Springer-Verlag, 2000, 0026-3672.

Other information

• Original language: English
• Type of outcome: Article in a journal
• Field of Study: 10302 Condensed matter physics
• Country of publisher: Austria
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• Impact factor: Impact factor: 1.303
• RIV identification code: RIV/00216224:14310/00:00002233
• Organization unit: Faculty of Science
• UT WoS: 000086810800042
• Keywords in English: Spectroscopic Ellipsometry; Spectroscopic Reflectometry; Atomic Force Microscopy; Rough Thin Films
• Tags: atomic force microscopy, Rough thin films, spectroscopic ellipsometry, Spectroscopic reflectometry

Abstract

In this paper the analysis of a family of rough silicon single crystal surfaces covered with native oxide layers is performed using a combined optical method based on a multisample treatment of the experimental data obtained using variable angle of spectroscopic ellipsometry and near normal spectroscopic reflectometry. Within this analysis the values of the thicknesses of the native oxide layers are determined together with the values of statistical parameters of roughness, i.e. with the rms values of the heights and the values of the autocorrelation lengths, for all the samples studied. For interpreting experimental data the perturbation Rayleigh-Rice theory and scalar diffraction theory are employed. By means of the results of the analysis achieved using both the theories limitations of the validity of these theories is discussed. The correctness of the values of the statistical parameters determined using the optical method is verified using AFM measurements.

Links

• GA202/98/0988, research and development project: Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod

Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods

• GV106/96/K245, research and development project: Name: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy

Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes

• VS96084, research and development project: Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze

Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague