ZAJÍČKOVÁ, Lenka, Kateřina VELTRUSKÁ, Nataliya TSUD a Daniel FRANTA. XPS and Ellipsometric Study of DLC/Silicon Interface. Vacuum. USA: ELSEVIER (PERGAMON), 2001, roč. 61, 2-4, s. 269-273. ISSN 0042-207X. |
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@article{366095, author = {Zajíčková, Lenka and Veltruská, Kateřina and Tsud, Nataliya and Franta, Daniel}, article_location = {USA}, article_number = {2-4}, keywords = {DLC films; XPS; Ellipsometry; Interface}, language = {eng}, issn = {0042-207X}, journal = {Vacuum}, title = {XPS and Ellipsometric Study of DLC/Silicon Interface}, url = {http://hydra.physics.muni.cz/~franta/bib/VAC61_269.html}, volume = {61}, year = {2001} }
TY - JOUR ID - 366095 AU - Zajíčková, Lenka - Veltruská, Kateřina - Tsud, Nataliya - Franta, Daniel PY - 2001 TI - XPS and Ellipsometric Study of DLC/Silicon Interface JF - Vacuum VL - 61 IS - 2-4 SP - 269-273 EP - 269-273 PB - ELSEVIER (PERGAMON) SN - 0042207X KW - DLC films KW - XPS KW - Ellipsometry KW - Interface UR - http://hydra.physics.muni.cz/~franta/bib/VAC61_269.html N2 - Diamond-like carbon (DLC) films were prepared by plasma enhanced CVD from the mixture of methane and argon on silicon substrates. Films were characterized by multi-sample modification of variable angle spectroscopic ellipsometry. The ellipsometry showed that there is a transition interlayer between the DLC film and the silicon substrate that cannot be attributed to a thin silicon dioxide layer but rather to amorphous silicon and/or modified oxide layer. TRIM calculations revealed that argon or carbon ions could not produce a significant layer of amorphous silicon because the depth of target atom displacements is bellow the thickness of a native oxide layer. The chemical composition of a DLC film profile including a DLC/silicon interface was studied by X-ray photoelectron spectroscopy (XPS) coupled with an argon sputtering of the 34 nm thick DLC film. The DLC/silicon interface composed from less than 6 % of oxygen and gradually decreasing and increasing carbon and silicon percentage, respectively. ER -
ZAJÍČKOVÁ, Lenka, Kateřina VELTRUSKÁ, Nataliya TSUD a Daniel FRANTA. XPS and Ellipsometric Study of DLC/Silicon Interface. \textit{Vacuum}. USA: ELSEVIER (PERGAMON), 2001, roč.~61, 2-4, s.~269-273. ISSN~0042-207X.
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