XPS and Ellipsometric Study of DLC/Silicon Interface

ZAJÍČKOVÁ, Lenka, Kateřina VELTRUSKÁ, Nataliya TSUD and Daniel FRANTA. XPS and Ellipsometric Study of DLC/Silicon Interface. Vacuum. USA: ELSEVIER (PERGAMON), 2001, vol. 61, 2-4, p. 269-273. ISSN 0042-207X.

Basic information

Original name

XPS and Ellipsometric Study of DLC/Silicon Interface

Authors

ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Kateřina VELTRUSKÁ (203 Czech Republic), Nataliya TSUD and Daniel FRANTA (203 Czech Republic)

Edition

Vacuum, USA, ELSEVIER (PERGAMON), 2001, 0042-207X

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Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 0.541

RIV identification code

RIV/00216224:14310/01:00004313

Organization unit

Faculty of Science

UT WoS

000168796500032

Keywords in English

DLC films; XPS; Ellipsometry; Interface

Tags

DLC films, ellipsometry, interface, XPS

Tags

International impact, Reviewed

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Abstract

V originále

Diamond-like carbon (DLC) films were prepared by plasma enhanced CVD from the mixture of methane and argon on silicon substrates. Films were characterized by multi-sample modification of variable angle spectroscopic ellipsometry. The ellipsometry showed that there is a transition interlayer between the DLC film and the silicon substrate that cannot be attributed to a thin silicon dioxide layer but rather to amorphous silicon and/or modified oxide layer. TRIM calculations revealed that argon or carbon ions could not produce a significant layer of amorphous silicon because the depth of target atom displacements is bellow the thickness of a native oxide layer. The chemical composition of a DLC film profile including a DLC/silicon interface was studied by X-ray photoelectron spectroscopy (XPS) coupled with an argon sputtering of the 34 nm thick DLC film. The DLC/silicon interface composed from less than 6 % of oxygen and gradually decreasing and increasing carbon and silicon percentage, respectively.

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Links

GA202/00/P037, research and development project	Name: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
GA202/98/0988, research and development project	Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
ME 301, research and development project	Name: Vývoj a průmyslová aplikace nových supertvrdých nanokrystalických kompozitních otěruvzdorných ochranných vrstev Investor: Ministry of Education, Youth and Sports of the CR, Development and Industrialization of Novel Superhard Nanocrystalline Composite Wear Protective Coatings
MSM 143100003, plan (intention)	Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
VS96084, research and development project	Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague